ALD Atomic Layer Deposition Planetary Susceptor

ʻO ka wehewehe pōkole:

Hoʻolālā ʻia ka ALD Atomic Layer Deposition Planetary Susceptor e Semicera no ka hoʻopaʻa ʻana i nā kiʻi ʻoniʻoni ʻoniʻoni pololei a kūlike i ka hana semiconductor. ʻO kāna hana paʻa a me nā mea holomua e hōʻoia i ka hana kiʻekiʻe a me ka lōʻihi. Hoʻonui ka susceptor o Semicera i ka maikaʻi o ka waiho ʻana a me ka maikaʻi o ke kaʻina hana, e lilo ia i mea koʻikoʻi no nā noi ALD ʻokiʻoki.

E hoʻouna i ka leka uila iā mākou

Huahana Huahana

ʻO ka Atomic Layer Deposition (ALD) kahi ʻenehana hoʻoheheʻe mahu e hoʻoulu i nā kiʻi ʻoniʻoni ʻoniʻoni ʻoniʻoni ma kēlā me kēia papa ma o ka hoʻokomo ʻana i ʻelua a ʻoi aʻe nā molekele precursor. Loaʻa iā ALD nā mea maikaʻi o ka mana kiʻekiʻe a me ke kūlike, a hiki ke hoʻohana nui ʻia i nā mea semiconductor, nā mea optoelectronic, nā mea mālama ikehu a me nā māla ʻē aʻe. Aia nā loina kumu o ALD i ka precursor adsorption, ka hopena o ka ʻili a me ka wehe ʻana o ka huahana, a hiki ke hoʻokumu ʻia nā mea hana multi-layer ma ka hana hou ʻana i kēia mau ʻanuʻu i kahi pōʻai. Loaʻa iā ALD nā hiʻohiʻona a me nā pōmaikaʻi o ka mana kiʻekiʻe, ka like ʻole, a me ke ʻano porous ʻole, a hiki ke hoʻohana ʻia no ka waiho ʻana o nā ʻano mea substrate a me nā mea like ʻole.

ALD Atomic Layer Deposition Planetary Susceptor (1)

Loaʻa iā ALD nā hiʻohiʻona a me nā pono:
1. Ka mana kiʻekiʻe:No ka mea ʻo ALD kahi kaʻina hoʻoulu ʻana i kēlā me kēia ʻāpana, hiki ke hoʻomalu pono ʻia ka mānoanoa a me ka hoʻohui ʻana o kēlā me kēia papa.
2. Kaulike:Hiki iā ALD ke waiho like i nā mea waiwai ma ka ʻili o ka substrate holoʻokoʻa, me ka pale ʻana i ka like ʻole e hiki mai ana ma nā ʻenehana deposition ʻē aʻe.
3. ʻAʻole porous hale:No ka mea, waiho ʻia ʻo ALD i loko o nā ʻāpana o nā ʻātoma hoʻokahi a i ʻole nā molekole hoʻokahi, ʻo ka hopena kiʻiʻoniʻoni maʻamau he ʻano paʻa, ʻaʻole porous.
4. Hana maikaʻi ka uhi ʻana:Hiki i ka ALD ke uhi pono i nā hoʻolālā ʻano kiʻekiʻe, e like me nā nanopore arrays, nā mea porosity kiʻekiʻe, etc.
5. Scalability:Hiki ke hoʻohana ʻia ka ALD no nā ʻano mea substrate like ʻole, me nā metala, semiconductor, aniani, etc.
6. ʻAnoʻano:Ma ke koho ʻana i nā molekole precursor ʻē aʻe, hiki ke waiho ʻia nā ʻano mea like ʻole i ke kaʻina ALD, e like me nā metal oxides, sulfides, nitride, etc.