Kiʻekiʻe Maʻemaʻe SiC Coated Graphite Wafer Carrier Susceptor

ʻO ke kiʻi i hōʻike ʻia ʻo SiC Coated Graphite Wafer Carrier Susceptor

ʻO ka wehewehe pōkole:

Hoʻolālā ʻia ʻo Semicera's High Purity SiC Carrier Susceptor no nā kaʻina hana semiconductor kiʻekiʻe a me nā kaʻina hana LED, e hāʻawi ana i ka paʻa wela a me ka hana ʻoi aku ka maikaʻi ma nā wela kiʻekiʻe. Hana ʻia mai ka carbide silicon maʻemaʻe kiʻekiʻe, ʻo kēia susceptor e hōʻoia i ka hāʻawi ʻana i ka wela, hoʻomaikaʻi i ke ʻano like ʻole, a hoʻonui i ka lōʻihi. Kūpono no MOCVD, CVD, a me nā noi wela kiʻekiʻe ʻē aʻe, ʻo Semicera's SiC carrier susceptor hāʻawi i ka hana hilinaʻi a lōʻihi, e kōkua ana i ka hoʻomaikaʻi ʻana i kāu hana hana a me ka maikaʻi o ka huahana.

E hoʻouna i ka leka uila iā mākou

Huahana Huahana

wehewehe

Loaʻa i ka silikon carbide ceramics nā waiwai mechanical maikaʻi loa i ka lumi lumi, e like me ka ikaika kiʻekiʻe, ka paʻakikī kiʻekiʻe, ka modulus elastic kiʻekiʻe, a me nā mea ʻē aʻe, he kūlana paʻa kiʻekiʻe kiʻekiʻe e like me ke kiʻekiʻe thermal conductivity, haʻahaʻa thermal expansion coefficient, a me ka ʻoʻoleʻa kikoʻī a me ka optical. hana hana.
He kūpono loa ia no ka hana ʻana i nā ʻāpana seramika pololei no nā mea hana kaapuni i hoʻohui ʻia e like me nā mīkini lithography, i hoʻohana nui ʻia no ka hana ʻana i ka mea lawe / susceptor SiC, wafer wafer SiC, ka ʻū ʻana disc, ka pā wai hoʻoheheʻe wai, ke ana ʻana i ka mea hoʻohālikelike, ka grating a me nā ʻāpana hana seramika.

lawe lawe2

lawe lawe3

lawe lawe4

Nā pono

Palena wela kiʻekiʻe: hoʻohana maʻamau ma 1800 ℃
ʻO ke kau wela wela kiʻekiʻe: e like me ka mea graphite
ʻO ka paʻakikī kiʻekiʻe: ʻoi aku ka lua o ka paʻakikī i ke daimana, boron nitride
ʻO ke kūpaʻa ʻana: ʻoi aku ka maikaʻi o ka ʻakika ikaika a me ka alkali, ʻoi aku ka maikaʻi o ka pale ʻana ma mua o ka tungsten carbide a me ka alumina.
Kaumaha māmā: haʻahaʻa haʻahaʻa, kokoke i ka alumini
ʻAʻohe deformation: ka helu haʻahaʻa o ka hoʻonui wela
ʻO ke kūpaʻa haʻalulu wela: hiki iā ia ke pale i nā loli wela ʻoi, pale i ka haʻalulu wela, a paʻa ka hana
Hoʻohana nui ʻia ka mea lawe kalapona silika e like me ka sic etching carrier, ICP etching susceptor, i ka semiconductor CVD, vacuum sputtering etc. Hiki iā mākou ke hāʻawi i nā mea kūʻai aku i nā mea lawe wafer maʻamau o nā mea silika a me nā mea carbide silicon e hālāwai me nā noi like ʻole.

Nā pono

Waiwai	Waiwai	ʻano hana
ʻO ka mānoanoa	3.21 g/cc	Piko-lele a me ke ana
wela kūikawā	0.66 J/g °K	Pulsed laser flash
Ka ikaika wiliwili	450 MPa560 MPa	4 piko piko, RT4 piko piko, 1300°
ʻOoleʻa haʻihaʻi	2.94 MPa m1/2	Microindentation
ʻoʻoleʻa	2800	ʻO Vicker, 500g ukana
Elastic ModulusYoung's Modulus	450 GPa430 GPa	4 pt piko, RT4 pt piko, 1300 °C
Ka nui o ka palaoa	2 – 10 µm	SEM

ʻIkepili Hui

ʻO WeiTai Energy Technology Co., Ltd. kahi mea hoʻolako alakaʻi o nā seramika semiconductor kiʻekiʻe a ʻo ka mea hana wale nō ma Kina e hiki ke hāʻawi like i ka silicon carbide ceramic maʻemaʻe kiʻekiʻe (ʻoi aku ka Recrystallized SiC) a me ka uhi CVD SiC. Eia kekahi, ua paʻa pū kā mākou hui i nā māla seramika e like me ka alumina, alumini nitride, zirconia, a me ka silicon nitride, etc.

ʻO kā mākou huahana nui e like me: silicon carbide etching disc, silicon carbide boat tow, silicon carbide wafer boat (Photovoltaic & Semiconductor), silicon carbide furnace tube, silicon carbide cantilever hoe, silicon carbide chucks, silicon carbide beam, a me ka CVD SiC coating a me TaC ka uhi ʻana. ʻO nā huahana i hoʻohana nui ʻia i ka semiconductor a me nā ʻoihana photovoltaic, e like me nā mea hana no ka ulu kristal, epitaxy, etching, packaging, coating and diffusion furnaces, etc.
e pili ana i (2)