Hoʻomaopopo ʻia nā ʻāpana paʻa CVD SILICON CARBIDE ma ke ʻano he koho mua no nā apo RTP/EPI a me nā kumu a me nā ʻāpana plasm aetch cavity e hana ana ma nā ʻōnaehana kiʻekiʻe e koi ʻia ana nā mahana hana (> 1500 ℃), ʻoi aku ka kiʻekiʻe o nā koi no ka maʻemaʻe (> 99.9995%) a ʻoi aku ka maikaʻi o ka hana inā ʻoi aku ka kiʻekiʻe o ke kūʻē ʻana i nā kemika. ʻAʻole i loaʻa i kēia mau mea nā ʻāpana lua ma ka ʻaoʻao o ka palaoa, no laila, ʻoi aku ka liʻiliʻi o kā lākou mau ʻāpana ma mua o nā mea ʻē aʻe. Eia hou, hiki ke hoʻomaʻemaʻeʻia kēia mau mea me ka hoʻohanaʻana i ka HF / HCl wela me ka hoʻohaʻahaʻa liʻiliʻi, e hopena i nā'āpana liʻiliʻi a me ka lōʻihi o ka lawelaweʻana.