Hoʻokaʻawale ʻia ke ʻano o ka uhi ʻana o ka photoresist i loko o ka uhi wili, ka uhi ʻana a me ka uhi ʻōwili, ma waena o ka hoʻohana pinepine ʻana i ka uhi ʻana. Ma ka wili ʻana, hoʻoheheʻe ʻia ka photoresist ma ka substrate, a hiki ke hoʻololi ʻia ka substrate i ka wikiwiki kiʻekiʻe e kiʻi i kahi kiʻi photoresist. Ma hope o kēlā, hiki ke loaʻa kahi kiʻi paʻa ma ka hoʻomehana ʻana ma kahi pā wela. He kūpono ka uhi ʻana no ka uhi ʻana mai nā kiʻiʻoniʻoni ultra-thin (e pili ana i 20nm) i nā kiʻiʻoniʻoni mānoanoa o kahi 100um. ʻO kona mau hiʻohiʻona he kūlike maikaʻi, ka mānoanoa kiʻiʻoniʻoni like ʻole ma waena o nā wafers, nā hemahema liʻiliʻi, etc.
Kaʻina wili wili
I ka wā o ka wili ʻana, ʻo ka wikiwiki o ka huli ʻana o ka substrate e hoʻoholo i ka mānoanoa kiʻiʻoniʻoni o ka photoresist. ʻO ka pilina ma waena o ka wikiwiki o ka huli ʻana a me ka mānoanoa kiʻiʻoniʻoni penei:
Milo=kTn
I ke kumu, ʻo Spin ka wikiwiki o ka hoʻololi ʻana; ʻO T ka mānoanoa kiʻiʻoniʻoni; he mau k a me n.
Nā mea e pili ana i ke kaʻina hana wili wili
ʻOiai ua hoʻoholo ʻia ka mānoanoa kiʻiʻoniʻoni e ka wikiwiki o ka rotation nui, pili pū ia me ka mahana o ka lumi, ka haʻahaʻa, ka viscosity photoresist a me ke ʻano photoresist. Hōʻike ʻia ka hoʻohālikelike ʻana o nā ʻano ʻano like ʻole o nā pihi uhi uhi photoresist ma ke Kiʻi 1.
Kiʻi 1: Ka hoʻohālikelike ʻana i nā ʻano ʻano like ʻole o nā ʻāpana pale uhi photoresist
Ka hopena o ka manawa hoʻololi nui
ʻO ka pōkole o ka manawa hoʻololi nui, ʻoi aku ka mānoanoa o ke kiʻiʻoniʻoni. Ke hoʻonui ʻia ka manawa hoʻololi nui, ʻoi aku ka lahilahi o ke kiʻiʻoniʻoni. Ke ʻoi aku ma mua o 20s, ʻaʻole i loli ka mānoanoa kiʻiʻoniʻoni. No laila, koho ʻia ka manawa hoʻololi nui ma mua o 20 kekona. Hōʻike ʻia ka pilina ma waena o ka manawa hoʻololi nui a me ka mānoanoa kiʻiʻoniʻoni ma ke Kiʻi 2.
Kiʻi 2: Ka pilina ma waena o ka manawa hoʻololi nui a me ka mānoanoa kiʻiʻoniʻoni
Ke hoʻoheheʻe ʻia ka photoresist ma luna o ka substrate, ʻoiai inā like ka wikiwiki o ka hoʻololi ʻana ma hope, ʻo ka wikiwiki o ka huli ʻana o ka substrate i ka wā o ka kulu ʻana e pili i ka mānoanoa kiʻiʻoniʻoni hope loa. Hoʻonui ka mānoanoa o ke kiʻi photoresist me ka piʻi ʻana o ka wikiwiki o ka huli ʻana o ka substrate i ka wā o ke kahe ʻana, ma muli o ka mana o ka evaporation solvent ke wehe ʻia ka photoresist ma hope o ke kahe ʻana. Hōʻike ka Figure 3 i ka pilina ma waena o ka mānoanoa kiʻiʻoniʻoni a me ka wikiwiki o ka hoʻololi ʻana ma nā ʻano like ʻole o ka hoʻololi ʻana o ka substrate i ka wā o ka kulu photoresist. Hiki ke ʻike ʻia ma ke kiʻi me ka piʻi ʻana o ka wikiwiki o ka hoʻololi ʻana o ka substrate dripping, ʻoi aku ka wikiwiki o ka mānoanoa o ke kiʻiʻoniʻoni, a ʻoi aku ka maopopo o ka ʻokoʻa ma ka wahi me ka wikiwiki o ka hoʻololi nui.
Kiʻi 3: ʻO ka pilina ma waena o ka mānoanoa kiʻiʻoniʻoni a me ka wikiwiki o ka hoʻololi ʻana i nā ʻano like ʻole o ka substrate i ka wā e hāʻawi ana i ka photoresist.
Ka hopena o ka haʻahaʻa i ka wā o ka uhi ʻana
Ke emi ka haʻahaʻa, piʻi ka mānoanoa o ke kiʻiʻoniʻoni, no ka mea, ʻo ka emi ʻana o ka haʻahaʻa e hāpai i ka evaporation o ka solvent. Eia naʻe, ʻaʻole loli nui ka māhele mānoanoa kiʻi. Hōʻike ke kiʻi 4 i ka pilina ma waena o ka haʻahaʻa a me ka māhele mānoanoa kiʻiʻoniʻoni i ka wā o ka uhi ʻana.
Kiʻi 4: Ka pilina ma waena o ka haʻahaʻa a me ka māhele mānoanoa kiʻiʻoniʻoni i ka wā o ka uhi ʻana
Ka hopena o ka wela i ka wā o ka uhi ʻana
Ke piʻi ka mahana o loko, piʻi ka mānoanoa kiʻiʻoniʻoni. Hiki ke ʻike ʻia mai ka Helu 5 e hoʻololi ana ka māhele mānoanoa kiʻi photoresist mai ka convex a i concave. Hōʻike pū ka pihi ma ke kiʻi i ka loaʻa ʻana o ka lokahi kiʻekiʻe ke loaʻa ka mahana o loko he 26°C a ʻo ka mahana photoresist ʻo 21°C.
Kiʻi 5: Ka pilina ma waena o ka wela a me ka māhele mānoanoa kiʻiʻoniʻoni i ka wā o ka uhi ʻana
Ka hopena o ka māmā holo i ka wā o ka uhi ʻana
Hōʻike ke kiʻi 6 i ka pilina ma waena o ka wikiwiki o ka pauku a me ka māhele mānoanoa kiʻiʻoniʻoni. I ka loaʻa ʻole o ka pau, hōʻike ia e mānoanoa ke kikowaena o ka wafer. ʻO ka hoʻonui ʻana i ka wikiwiki hoʻopau e hoʻomaikaʻi i ka like ʻole, akā inā e hoʻonui nui ʻia, e emi ka like. Hiki ke ʻike ʻia aia kahi waiwai maikaʻi loa no ka wikiwiki hoʻopau.
Kiʻi 6: Ka pilina ma waena o ka mānoanoa o ke kiʻiʻoniʻoni
Lapaʻau HMDS
I mea e hoʻomaʻamaʻa ʻia ai ka photoresist, pono e mālama ʻia ka wafer me ka hexamethyldisilazane (HMDS). ʻOi loa i ka wā e hoʻopili ʻia ai ka wai i ka ʻili o ka kiʻi ʻoniʻoni Si oxide, ua hoʻokumu ʻia ka silanol, kahi e hoʻemi ai i ka pili ʻana o ka photoresist. I mea e wehe ai i ka makū a hoʻoheheʻe ʻia ka silanol, hoʻomehana mau ʻia ka wafer i 100-120 ° C, a hoʻokomo ʻia ka noe HMDS e hoʻoulu i kahi hopena kemika. Hōʻike ʻia ke ʻano hana pane ma ke Kiʻi 7. Ma o ka mālama ʻana iā HMDS, lilo ka ʻili hydrophilic me kahi kihi pili liʻiliʻi i mea hydrophobic me kahi kihi pili nui. ʻO ka hoʻomehana ʻana i ka wafer hiki ke loaʻa ka hoʻopili photoresist kiʻekiʻe.
Kiʻi 7: ʻO ka mīkini hoʻololi HMDS
Hiki ke ʻike ʻia ka hopena o ka mālama ʻana i ka HMDS ma ke ana ʻana i ke kihi pili. Hōʻike ke kiʻi 8 i ka pilina ma waena o ka manawa lapaʻau HMDS a me ke kihi hoʻopili (ka mahana mālama 110°C). ʻO ka substrate ʻo Si, ʻoi aku ka nui o ka manawa lapaʻau HMDS ma mua o 1min, ʻoi aku ka nui o ke kihi pili ma mua o 80 °, a paʻa ka hopena lapaʻau. Hōʻike ka Figure 9 i ka pilina ma waena o ka wela lapaʻau HMDS a me ke kihi pili (manawa mālama 60s). Ke ʻoi aku ka mahana ma mua o 120 ℃, e emi ana ka huina pili, e hōʻike ana ua decompose ka HMDS ma muli o ka wela. No laila, hana maʻamau ka HMDS ma 100-110 ℃.
Kiʻi 8: Ka pilina ma waena o ka manawa lapaʻau HMDS
a me ka huina pili (ka wela lapaʻau 110 ℃)
Kiʻi 9: Ka pilina ma waena o ka wela lapaʻau HMDS a me ke kihi pili (manawa mālama 60s)
Hana ʻia ka mālama ʻana i ka HMDS ma kahi substrate silika me kahi kiʻiʻoniʻoni oxide e hana i kahi ʻano photoresist. Hoʻopili ʻia ke kiʻi oxide me ka waika hydrofluoric me kahi paʻi i hoʻohui ʻia, a ʻike ʻia ma hope o ka mālama ʻana i ka HMDS, hiki ke mālama ʻia ke kumu photoresist mai ka hāʻule ʻana. Hōʻike ka helu 10 i ka hopena o ka mālama ʻana i ka HMDS (ʻo 1um ka nui o ke ʻano).
Kiʻi 10: Ka hopena lapaʻau HMDS (1um ka nui o ke ʻano)
Prebaking
Ma ka wikiwiki o ka hoʻololi ʻana, ʻoi aku ka kiʻekiʻe o ka prebaking wela, ʻoi aku ka liʻiliʻi o ka mānoanoa kiʻiʻoniʻoni, e hōʻike ana ʻoi aku ka kiʻekiʻe o ka prebaking wela, ʻoi aku ka nui o ka solvent evaporates, e hopena i kahi mānoanoa kiʻi ʻoniʻoni. Hōʻike ka Figure 11 i ka pilina ma waena o ka wela ma mua o ka hoʻomoʻa ʻana a me ke ʻano o Dill's A. Hōʻike ka ʻāpana A i ka neʻe ʻana o ka mea hana photosensitive. E like me ka mea i ʻike ʻia mai ke kiʻi, i ka wā e piʻi ai ka mahana ma mua o ka kuke ʻana ma luna o 140 ° C, e emi ana ka ʻāpana A, e hōʻike ana i ka decomposes o ka mea kiʻi kiʻi kiʻi i kahi mahana ʻoi aku ka kiʻekiʻe o kēia. Hōʻike ka Figure 12 i ka transmittance spectral i nā mahana like ʻole ma mua o ka kuke ʻana. Ma 160 ° C a me 180 ° C, hiki ke ʻike ʻia ka piʻi ʻana o ka transmittance ma ka laulā nalu o 300-500nm. Hōʻoia kēia e kālua ʻia ka mea hana photosensitive a decomposed i nā wela kiʻekiʻe. He waiwai maikaʻi loa ka mahana o ka pre-baking, i hoʻoholo ʻia e nā hiʻohiʻona māmā a me ka naʻau.
Kiʻi 11: Ka pilina ma waena o ka mahana ma mua o ka hoʻomoʻa ʻana a me ka ʻāpana A Dill
(waiwai ana o OFPR-800/2)
Kiʻi 12: ʻO ka hoʻouna ʻana i nā kikoʻī ma nā ʻano wela ma mua o ka hoʻomoʻa ʻana
(OFPR-800, 1um mānoanoa kiʻiʻoniʻoni)
I ka pōkole, loaʻa i ke ʻano o ka spin coating nā pōmaikaʻi like ʻole e like me ke kaohi pololei ʻana i ka mānoanoa o ke kiʻiʻoniʻoni, ka hana kiʻekiʻe o ke kumukūʻai, nā kūlana hana maʻalahi, a me ka hana maʻalahi, no laila he hopena koʻikoʻi i ka hōʻemi ʻana i ka pollution, mālama i ka ikehu, a me ka hoʻomaikaʻi ʻana i ka hana kumukūʻai. I kēia mau makahiki i hala iho nei, ua hoʻonui ʻia ka nānā ʻana o ka spin coating, a ua laha mālie kāna noi i nā ʻano like ʻole.
Ka manawa hoʻouna: Nov-27-2024