ʻO CVD Silicon Carbide Coating-1

He aha ka CVD SiC

ʻO ka hoʻoheheʻe ʻana i ka mahu (CVD) kahi kaʻina hana hoʻoheheʻe ʻana i hoʻohana ʻia e hana i nā mea paʻa maʻemaʻe kiʻekiʻe. Hoʻohana pinepine ʻia kēia kaʻina hana i ke kahua hana semiconductor e hana i nā kiʻiʻoniʻoni lahilahi ma ka ʻili o nā wafers. Ma ke kaʻina hana o ka hoʻomākaukau ʻana iā SiC e CVD, ʻike ʻia ka substrate i hoʻokahi a i ʻole nā ​​​​mea hoʻoheheʻe volatile, ka mea e hana kemika ma ka ʻili o ka substrate e waiho i ka waihona SiC makemake. Ma waena o nā ʻano hana he nui no ka hoʻomākaukau ʻana i nā mea SiC, ʻo nā huahana i hoʻomākaukau ʻia e ka hoʻoheheʻe ʻana i ka mahu kemika he kiʻekiʻe ka like a me ka maʻemaʻe, a ʻo ke ʻano he mana ikaika o ke kaʻina hana.

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He kūpono loa nā mea CVD SiC no ka hoʻohana ʻana i ka ʻoihana semiconductor e koi ana i nā mea hana kiʻekiʻe ma muli o kā lākou hui kūʻokoʻa o nā mea wela maikaʻi, uila a me nā mea kemika. Hoʻohana nui ʻia nā ʻāpana CVD SiC i nā lako etching, nā lako MOCVD, nā lako epitaxial Si a me nā lako epitaxial SiC, nā mea hana hoʻōla wela wikiwiki a me nā māla ʻē aʻe.

ʻO ka holoʻokoʻa, ʻo ka māhele mākeke nui loa o nā ʻāpana CVD SiC he etching nā mea hana. Ma muli o kona haʻahaʻa haʻahaʻa a me ka conductivity i ka chlorine- a me ka fluorine-containing etching gases, CVD silicon carbide kahi mea kūpono no nā ʻāpana e like me nā apo kiko i nā lako etching plasma.

ʻO nā ʻāpana carbide silikon CVD i nā mea hana etching, ʻo ia nā apo kiko, nā poʻo ʻauʻau hau, nā pā, nā apo lihi, a me nā mea ʻē aʻe. Ma ka hoʻohana ʻana i ka volta i ke apo e kālele i ka plasma e hele ana ma ke apo, ua kau ʻia ka plasma i ka wafer e hoʻomaikaʻi i ka like o ka hana.

Hana ʻia nā apo kuʻuna kuʻuna i ke silika a i ʻole quartz. Me ka holomua o ka integrated circuit miniaturization, ke koi a me ke koʻikoʻi o nā kaʻina hana etching i ka hana kaiapuni hoʻohui e hoʻonui nei, a ke hoʻomau nei ka mana a me ka ikaika o ka etching plasma. ʻO ka mea kūikawā, ʻoi aku ka kiʻekiʻe o ka ikehu plasma e pono ai i nā mea hana etching plasma capacitively coupled (CCP), no laila ke hoʻonui nei ka hoʻohana ʻana o nā apo kiko i hana ʻia me nā mea silicon carbide. Hōʻike ʻia ke kiʻikuhi schematic o CVD silicon carbide focus ring ma lalo nei.

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Ka manawa hoʻouna: Iune-20-2024