ʻO Epitaxy

ʻO ka wehewehe pōkole:

ʻO Epitaxy- Loaʻa i ka hana ʻoi aku ka maikaʻi me ka Semicera's Si Epitaxy, e hāʻawi ana i nā papa silikona i ulu pono no nā noi semiconductor holomua.


Huahana Huahana

Huahana Huahana

Semicerahoʻolauna i kona kūlana kiʻekiʻeʻO Epitaxynā lawelawe, i hoʻolālā ʻia e hoʻokō i nā kūlana kūpono o ka ʻoihana semiconductor o kēia lā. He mea koʻikoʻi nā papa silicon Epitaxial no ka hana a me ka hilinaʻi o nā mea uila, a ʻo kā mākou Si Epitaxy solutions e hōʻoia i ka loaʻa ʻana o kāu mau ʻāpana i ka hana maikaʻi loa.

ʻO nā ʻāpana Silika i ulu pono Semiceraʻike ʻo ia ke kumu o nā mea hana kiʻekiʻe i ka maikaʻi o nā mea i hoʻohana ʻia. ʻO kā mākouʻO EpitaxyHoʻoponopono maikaʻi ʻia ke kaʻina hana e hana i nā ʻāpana silika me ka ʻokoʻa like ʻole a me ka pololei aniani. Pono kēia mau papa no nā noi mai ka microelectronics a hiki i nā mana mana kiʻekiʻe, kahi mea nui ka paʻa a me ka hilinaʻi.

Hoʻonui ʻia no ka hana ʻana o ka hāmeʻaʻO kaʻO Epitaxynā lawelawe i hāʻawi ʻia e Semicera e hoʻomaikaʻi i nā waiwai uila o kāu mau polokalamu. Ma ka hoʻoulu ʻana i nā papa silika maʻemaʻe kiʻekiʻe me nā haʻahaʻa haʻahaʻa haʻahaʻa, hōʻoia mākou i ka hana maikaʻi o kāu mau ʻāpana, me ka hoʻomaikaʻi ʻana i ka neʻe ʻana a me ka hoʻemi ʻana i ka pale uila. He mea koʻikoʻi kēia loiloi no ka hoʻokō ʻana i nā hiʻohiʻona kiʻekiʻe a me nā hiʻohiʻona kiʻekiʻe i koi ʻia e ka ʻenehana hou.

Versatility i nā noi Semicera'sʻO EpitaxyHe kūpono ia no ka nui o nā noi, me ka hana ʻana i nā transistors CMOS, nā MOSFET mana, a me nā transistors junction bipolar. Hiki i kā mākou kaʻina hana maʻalahi ke hana maʻamau e pili ana i nā koi kikoʻī o kāu papahana, inā paha ʻoe e makemake i nā ʻāpana lahilahi no nā noi kiʻekiʻe a i ʻole nā ​​papa mānoanoa no nā mea mana.

ʻOi aku ka maikaʻi o ka waiwaiAia ka maikaʻi ma ka puʻuwai o nā mea a pau a mākou e hana ai ma Semicera. ʻO kā mākouʻO Epitaxyke hoʻohana nei ke kaʻina hana i nā mea hana a me nā ʻenehana hou e hōʻoia i ka hoʻokō ʻana o kēlā me kēia papa silicon i nā kūlana kiʻekiʻe o ka maʻemaʻe a me ka pono o ka hoʻolālā. ʻO kēia nānā i nā kikoʻī e hōʻemi i ka hiki ʻana mai o nā hemahema i hiki ke hoʻopilikia i ka hana ʻana o ka hāmeʻa, ka hopena i nā mea hilinaʻi a lōʻihi.

Hoʻoholo i ka hana hou Semiceraua kūpaʻa ʻo ia e noho ma ke alo o ka ʻenehana semiconductor. ʻO kā mākouʻO EpitaxyHōʻike nā lawelawe i kēia kūpaʻa, e hoʻopili ana i nā holomua hou loa i nā ʻenehana ulu epitaxial. Hoʻomaʻamaʻa mau mākou i kā mākou mau kaʻina hana no ka hoʻopuka ʻana i nā papa silika e kū ana i nā pono e ulu nei o ka ʻoihana, e hōʻoia ana i ka hoʻokūkū ʻana o kāu huahana i ka mākeke.

Nā Haʻina Hana Hana no kāu PonoʻO ka hoʻomaopopo ʻana he ʻokoʻa kēlā me kēia papahana,Semicerahāʻawi maʻamauʻO Epitaxynā hāʻina e kūlike i kāu mau pono kikoʻī. Inā makemake ʻoe i nā profile doping kūikawā, ka mānoanoa o ka papa, a i ʻole ka hoʻopau ʻana o ka ʻili, hana pū kā mākou hui me ʻoe e hāʻawi i kahi huahana i kūpono i kāu kikoʻī kikoʻī.

Nā mea

Paahana

Ka noiʻi

Dummy

Nā Kūlana Crystal

Polytype

4H

Ua hewa ka hoʻonohonoho ʻana o ka ʻili

<11-20 >4±0.15°

Nā Kūlana Uila

Dopant

n-ʻano Nitrogen

Kū'ē

0.015-0.025ohm·cm

Nā Kūlana Mechanical

Anawaena

150.0±0.2mm

mānoanoa

350±25 μm

Kūlana pālahalaha mua

[1-100]±5°

Ka lōʻihi pālahalaha mua

47.5±1.5mm

palahalaha lua

ʻAʻohe

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm(5mm*5mm)

≤5 μm(5mm*5mm)

≤10 μm(5mm*5mm)

Kakaka

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

Warp

≤35 μm

≤45 μm

≤55 μm

'Oka (AFM) mua (Si-maka)

Ra≤0.2nm (5μm*5μm)

Hoʻolālā

Micropipe mānoanoa

<1 ea/cm2

<10 ea/cm2

<15 ea/cm2

Metala haumia

≤5E10atoms/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

ʻAno o mua

Imua

Si

Hoʻopau ʻili

Si-maka CMP

Nā ʻāpana

≤60ea/wafer (nui≥0.3μm)

NA

Nā ʻōpala

≤5ea/mm. Ka lōʻihi huila ≤Diameter

ʻO ka lōʻihi huila≤2*Diameter

NA

ʻAlani ʻili/mau lua/ʻeleʻele/striations/ māwae/contamination

ʻAʻohe

NA

Nā ʻāpana lihi/indents/fracture/papa hex

ʻAʻohe

Nā wahi polytype

ʻAʻohe

ʻĀpana huila≤20%

ʻĀpana huila≤30%

Hōʻailona laser mua

ʻAʻohe

ʻAno o hope

Hoʻopau hope

C-maka CMP

Nā ʻōpala

≤5ea / mm, Ka lōʻihi huila≤2 * Anawaena

NA

Nā pōʻino hope (nā ʻāpana lihi/indents)

ʻAʻohe

ʻōkalakala kua

Ra≤0.2nm (5μm*5μm)

Hōʻailona laser hope

1 mm (mai ka lihi luna)

Kaulana

Kaulana

Chamfer

Hoʻopili ʻia

Hoʻopili ʻia

Epi-mākaukau me ka hoʻopaʻa ʻumeke

Puke cassette nui-wafer

*Nā memo: "NA" ʻo ia hoʻi, ʻaʻohe noi ʻO nā mea i ʻōlelo ʻole ʻia e pili ana i SEMI-STD.

tech_1_2_size
SiC wafers

  • Mua:
  • Aʻe: