ʻO ka substrate

ʻO ka wehewehe pōkole:

Me kona ʻoi aku ka pololei a me ka maʻemaʻe kiʻekiʻe, hōʻoia ʻo Semicera's Si Substrate i ka hana hilinaʻi a paʻa mau i nā noi koʻikoʻi, me ka hana ʻana o Epi-Wafer a me Gallium Oxide (Ga2O3). Hoʻolālā ʻia e kākoʻo i ka hana ʻana o nā microelectronics kiʻekiʻe, hāʻawi kēia substrate i ka hoʻohālikelike ʻokoʻa a me ke kūpaʻa, e lilo ia i mea pono no nā ʻenehana ʻokiʻoki i ke kelepona, automotive, a me nā ʻoihana ʻoihana.


Huahana Huahana

Huahana Huahana

ʻO ka Si Substrate e Semicera he mea koʻikoʻi i ka hana ʻana i nā mea hana semiconductor kiʻekiʻe. Hoʻolālā ʻia mai Silicon (Si) hoʻomaʻemaʻe kiʻekiʻe, hāʻawi kēia substrate i ke kūlike kūʻokoʻa, kūpaʻa, a me ka conductivity maikaʻi loa, i mea kūpono no kahi ākea o nā noi holomua i ka ʻoihana semiconductor. Inā hoʻohana ʻia ma Si Wafer, SiC Substrate, SOI Wafer, a i ʻole SiN Substrate hana, hāʻawi ka Semicera Si Substrate i ka maikaʻi a me ka hana ʻoi aku ka maikaʻi e hoʻokō i nā koi ulu o nā mea uila a me nā ʻepekema waiwai.

Hana Kūlike ʻole me ka Maʻemaʻe kiʻekiʻe a me ka pololei

Hana ʻia ʻo Semicera's Si Substrate me ka hoʻohana ʻana i nā kaʻina holomua e hōʻoia i ka maʻemaʻe kiʻekiʻe a me ka mana paʻa. ʻO ka substrate ke kumu no ka hana ʻana i nā ʻano mea hana kiʻekiʻe, me nā Epi-Wafers a me AlN Wafers. ʻO ka pololei a me ke kūlike o ka Si Substrate he koho maikaʻi loa ia no ka hana ʻana i nā ʻāpana epitaxial kiʻiʻoniʻoni lahilahi a me nā mea koʻikoʻi ʻē aʻe i hoʻohana ʻia i ka hana ʻana o nā semiconductors hope. Inā ʻoe e hana pū ana me Gallium Oxide (Ga2O3) a i ʻole nā ​​​​mea holomua ʻē aʻe, ʻo Semicera's Si Substrate e hōʻoia i nā pae kiʻekiʻe o ka hilinaʻi a me ka hana.

Nā noi ma ka hana semiconductor

Ma ka ʻoihana semiconductor, hoʻohana ʻia ka Si Substrate mai Semicera i kahi ākea o nā noi, me ka Si Wafer a me SiC Substrate production, kahi e hāʻawi ai i kahi kumu paʻa, hilinaʻi no ka waiho ʻana o nā papa hana. He kuleana koʻikoʻi ka substrate i ka hana ʻana i nā SOI Wafers (Silicon On Insulator), he mea nui ia no nā microelectronics kiʻekiʻe a me nā kaapuni hoʻohui. Eia kekahi, ʻo nā Epi-Wafers (epitaxial wafers) i kūkulu ʻia ma luna o Si Substrates he mea koʻikoʻi i ka hana ʻana i nā mea hana semiconductor kiʻekiʻe e like me nā transistors mana, diodes, a me nā kaapuni hoʻohui.

Kākoʻo pū ka Si Substrate i ka hana ʻana o nā mea hoʻohana me Gallium Oxide (Ga2O3), kahi mea hoʻohiki ākea ākea i hoʻohana ʻia no nā noi mana kiʻekiʻe i ka uila uila. Hoʻohui ʻia, ʻo ka hoʻohālikelike ʻana o Semicera's Si Substrate me AlN Wafers a me nā substrates holomua ʻē aʻe e hōʻoia i hiki iā ia ke hoʻokō i nā koi like ʻole o nā ʻoihana ʻenehana kiʻekiʻe, e lilo ia i mea hoʻonā kūpono no ka hana ʻana i nā mea ʻoki ʻoki i ke kelepona, automotive, a me nā ʻoihana ʻoihana. .

ʻO ka maikaʻi hilinaʻi a kūlike no nā noi ʻenehana kiʻekiʻe

Hoʻolālā maikaʻi ʻia ka Si Substrate e Semicera e hoʻokō i nā koi ikaika o ka hana semiconductor. ʻO kona kūpaʻa kūʻokoʻa a me nā waiwai o ka ʻili kiʻekiʻe e lilo ia i mea kūpono no ka hoʻohana ʻana i nā ʻōnaehana cassette no ka lawe ʻana i ka wafer, a me ka hana ʻana i nā papa kiʻekiʻe i nā mea semiconductor. ʻO ka hiki i ka substrate ke mālama i ka maikaʻi ma lalo o nā kūlana kaʻina hana like ʻole e hōʻoia i nā hemahema liʻiliʻi, hoʻonui i ka hua a me ka hana o ka huahana hope.

Me kona conductivity thermal maikaʻi, ikaika mechanical, a me ka maʻemaʻe kiʻekiʻe, ʻo Semicera's Si Substrate ka mea i koho ʻia no nā mea hana e ʻimi nei e hoʻokō i nā kūlana kiʻekiʻe o ka pololei, hilinaʻi, a me ka hana i ka hana semiconductor.

E koho i ka Semicera's Si Substrate no ka Ma'ema'e Ki'eki'e, Nā Hana Hana Ki'eki'e

No nā mea hana i ka ʻoihana semiconductor, hāʻawi ka Si Substrate mai Semicera i kahi hopena paʻa, kiʻekiʻe kiʻekiʻe no ka nui o nā noi, mai ka hana ʻana ʻo Si Wafer a hiki i ka hana ʻana i nā Epi-Wafers a me SOI Wafers. Me ka maʻemaʻe like ʻole, ka pololei, a me ka hilinaʻi, hiki i kēia substrate ke hana i nā mea hana semiconductor ʻokiʻoki, e hōʻoia i ka hana lōʻihi a me ka maikaʻi maikaʻi. E koho iā Semicera no kāu mau pono substrate, a hilinaʻi i kahi huahana i hoʻolālā ʻia e hoʻokō i nā koi o nā ʻenehana o ka lā ʻapōpō.

Nā mea

Paahana

Ka noiʻi

Dummy

Nā Kūlana Crystal

Polytype

4H

Ua hewa ka hoʻonohonoho ʻana o ka ʻili

<11-20 >4±0.15°

Nā Kūlana Uila

Dopant

n-ʻano Nitrogen

Kū'ē

0.015-0.025ohm·cm

Nā Kūlana Mechanical

Anawaena

150.0±0.2mm

mānoanoa

350±25 μm

Kūlana pālahalaha mua

[1-100]±5°

Ka lōʻihi pālahalaha mua

47.5±1.5mm

palahalaha lua

ʻAʻohe

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm(5mm*5mm)

≤5 μm(5mm*5mm)

≤10 μm(5mm*5mm)

Kakaka

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

Warp

≤35 μm

≤45 μm

≤55 μm

'Oka (AFM) mua (Si-maka)

Ra≤0.2nm (5μm*5μm)

Hoʻolālā

Micropipe mānoanoa

<1 ea/cm2

<10 ea/cm2

<15 ea/cm2

Metala haumia

≤5E10atoms/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

ʻAno o mua

Imua

Si

Hoʻopau ʻili

Si-maka CMP

Nā ʻāpana

≤60ea/wafer (nui≥0.3μm)

NA

Nā ʻōpala

≤5ea/mm. Ka lōʻihi huila ≤Diameter

ʻO ka lōʻihi huila≤2*Diameter

NA

ʻAlani ʻili/mau lua/ʻeleʻele/striations/ māwae/contamination

ʻAʻohe

NA

Nā ʻāpana lihi/indents/fracture/papa hex

ʻAʻohe

Nā wahi polytype

ʻAʻohe

ʻĀpana huila≤20%

ʻĀpana huila≤30%

Hōʻailona laser mua

ʻAʻohe

ʻAno o hope

Hoʻopau hope

C-maka CMP

Nā ʻōpala

≤5ea / mm, Ka lōʻihi huila≤2 * Anawaena

NA

Nā pōʻino hope (nā ʻāpana lihi/indents)

ʻAʻohe

ʻōkalakala kua

Ra≤0.2nm (5μm*5μm)

Hōʻailona laser hope

1 mm (mai ka lihi luna)

Kaulana

Kaulana

Chamfer

Hoʻopili ʻia

Hoʻopili ʻia

Epi-mākaukau me ka hoʻopaʻa ʻumeke

Puke cassette nui-wafer

*Nā memo: "NA" ʻo ia hoʻi, ʻaʻohe noi ʻO nā mea i ʻōlelo ʻole ʻia e pili ana i SEMI-STD.

tech_1_2_size
SiC wafers

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