ʻO ka Si Substrate e Semicera he mea koʻikoʻi i ka hana ʻana i nā mea hana semiconductor kiʻekiʻe. Hoʻolālā ʻia mai Silicon (Si) hoʻomaʻemaʻe kiʻekiʻe, hāʻawi kēia substrate i ke kūlike kūʻokoʻa, kūpaʻa, a me ka conductivity maikaʻi loa, i mea kūpono no kahi ākea o nā noi holomua i ka ʻoihana semiconductor. Inā hoʻohana ʻia ma Si Wafer, SiC Substrate, SOI Wafer, a i ʻole SiN Substrate hana, hāʻawi ka Semicera Si Substrate i ka maikaʻi a me ka hana ʻoi aku ka maikaʻi e hoʻokō i nā koi ulu o nā mea uila a me nā ʻepekema waiwai.
Hana Kūlike ʻole me ka Maʻemaʻe kiʻekiʻe a me ka pololei
Hana ʻia ʻo Semicera's Si Substrate me ka hoʻohana ʻana i nā kaʻina holomua e hōʻoia i ka maʻemaʻe kiʻekiʻe a me ka mana paʻa. ʻO ka substrate ke kumu no ka hana ʻana i nā ʻano mea hana kiʻekiʻe, me nā Epi-Wafers a me AlN Wafers. ʻO ka pololei a me ke kūlike o ka Si Substrate he koho maikaʻi loa ia no ka hana ʻana i nā ʻāpana epitaxial kiʻiʻoniʻoni lahilahi a me nā mea koʻikoʻi ʻē aʻe i hoʻohana ʻia i ka hana ʻana o nā semiconductors hope. Inā ʻoe e hana pū ana me Gallium Oxide (Ga2O3) a i ʻole nā mea holomua ʻē aʻe, ʻo Semicera's Si Substrate e hōʻoia i nā pae kiʻekiʻe o ka hilinaʻi a me ka hana.
Nā noi ma ka hana semiconductor
Ma ka ʻoihana semiconductor, hoʻohana ʻia ka Si Substrate mai Semicera i kahi ākea o nā noi, me ka Si Wafer a me SiC Substrate production, kahi e hāʻawi ai i kahi kumu paʻa, hilinaʻi no ka waiho ʻana o nā papa hana. He kuleana koʻikoʻi ka substrate i ka hana ʻana i nā SOI Wafers (Silicon On Insulator), he mea nui ia no nā microelectronics kiʻekiʻe a me nā kaapuni hoʻohui. Eia kekahi, ʻo nā Epi-Wafers (epitaxial wafers) i kūkulu ʻia ma luna o Si Substrates he mea koʻikoʻi i ka hana ʻana i nā mea hana semiconductor kiʻekiʻe e like me nā transistors mana, diodes, a me nā kaapuni hoʻohui.
Kākoʻo pū ka Si Substrate i ka hana ʻana o nā mea hoʻohana me Gallium Oxide (Ga2O3), kahi mea hoʻohiki ākea ākea i hoʻohana ʻia no nā noi mana kiʻekiʻe i ka uila uila. Hoʻohui ʻia, ʻo ka hoʻohālikelike ʻana o Semicera's Si Substrate me AlN Wafers a me nā substrates holomua ʻē aʻe e hōʻoia i hiki iā ia ke hoʻokō i nā koi like ʻole o nā ʻoihana ʻenehana kiʻekiʻe, e lilo ia i mea hoʻonā kūpono no ka hana ʻana i nā mea ʻoki ʻoki i ke kelepona, automotive, a me nā ʻoihana ʻoihana. .
ʻO ka maikaʻi hilinaʻi a kūlike no nā noi ʻenehana kiʻekiʻe
Hoʻolālā maikaʻi ʻia ka Si Substrate e Semicera e hoʻokō i nā koi ikaika o ka hana semiconductor. ʻO kona kūpaʻa kūʻokoʻa a me nā waiwai o ka ʻili kiʻekiʻe e lilo ia i mea kūpono no ka hoʻohana ʻana i nā ʻōnaehana cassette no ka lawe ʻana i ka wafer, a me ka hana ʻana i nā papa kiʻekiʻe i nā mea semiconductor. ʻO ka hiki i ka substrate ke mālama i ka maikaʻi ma lalo o nā kūlana kaʻina hana like ʻole e hōʻoia i nā hemahema liʻiliʻi, hoʻonui i ka hua a me ka hana o ka huahana hope.
Me kona conductivity thermal maikaʻi, ikaika mechanical, a me ka maʻemaʻe kiʻekiʻe, ʻo Semicera's Si Substrate ka mea i koho ʻia no nā mea hana e ʻimi nei e hoʻokō i nā kūlana kiʻekiʻe o ka pololei, hilinaʻi, a me ka hana i ka hana semiconductor.
E koho i ka Semicera's Si Substrate no ka Ma'ema'e Ki'eki'e, Nā Hana Hana Ki'eki'e
No nā mea hana i ka ʻoihana semiconductor, hāʻawi ka Si Substrate mai Semicera i kahi hopena paʻa, kiʻekiʻe kiʻekiʻe no ka nui o nā noi, mai ka hana ʻana ʻo Si Wafer a hiki i ka hana ʻana i nā Epi-Wafers a me SOI Wafers. Me ka maʻemaʻe like ʻole, ka pololei, a me ka hilinaʻi, hiki i kēia substrate ke hana i nā mea hana semiconductor ʻokiʻoki, e hōʻoia i ka hana lōʻihi a me ka maikaʻi maikaʻi. E koho iā Semicera no kāu mau pono substrate, a hilinaʻi i kahi huahana i hoʻolālā ʻia e hoʻokō i nā koi o nā ʻenehana o ka lā ʻapōpō.
Nā mea | Paahana | Ka noiʻi | Dummy |
Nā Kūlana Crystal | |||
Polytype | 4H | ||
Ua hewa ka hoʻonohonoho ʻana o ka ʻili | <11-20 >4±0.15° | ||
Nā Kūlana Uila | |||
Dopant | n-ʻano Nitrogen | ||
Kū'ē | 0.015-0.025ohm·cm | ||
Nā Kūlana Mechanical | |||
Anawaena | 150.0±0.2mm | ||
mānoanoa | 350±25 μm | ||
Kūlana pālahalaha mua | [1-100]±5° | ||
Ka lōʻihi pālahalaha mua | 47.5±1.5mm | ||
palahalaha lua | ʻAʻohe | ||
TTV | ≤5 μm | ≤10 μm | ≤15 μm |
LTV | ≤3 μm(5mm*5mm) | ≤5 μm(5mm*5mm) | ≤10 μm(5mm*5mm) |
Kakaka | -15μm ~ 15μm | -35μm ~ 35μm | -45μm ~ 45μm |
Warp | ≤35 μm | ≤45 μm | ≤55 μm |
'Oka (AFM) mua (Si-maka) | Ra≤0.2nm (5μm*5μm) | ||
Hoʻolālā | |||
Micropipe mānoanoa | <1 ea/cm2 | <10 ea/cm2 | <15 ea/cm2 |
Metala haumia | ≤5E10atoms/cm2 | NA | |
BPD | ≤1500 ea/cm2 | ≤3000 ea/cm2 | NA |
TSD | ≤500 ea/cm2 | ≤1000 ea/cm2 | NA |
ʻAno o mua | |||
Imua | Si | ||
Hoʻopau ʻili | Si-maka CMP | ||
Nā ʻāpana | ≤60ea/wafer (nui≥0.3μm) | NA | |
Nā ʻōpala | ≤5ea/mm. Ka lōʻihi huila ≤Diameter | ʻO ka lōʻihi huila≤2*Diameter | NA |
ʻAlani ʻili/mau lua/ʻeleʻele/striations/ māwae/contamination | ʻAʻohe | NA | |
Nā ʻāpana lihi/indents/fracture/papa hex | ʻAʻohe | ||
Nā wahi polytype | ʻAʻohe | ʻĀpana huila≤20% | ʻĀpana huila≤30% |
Hōʻailona laser mua | ʻAʻohe | ||
ʻAno o hope | |||
Hoʻopau hope | C-maka CMP | ||
Nā ʻōpala | ≤5ea / mm, Ka lōʻihi huila≤2 * Anawaena | NA | |
Nā pōʻino hope (nā ʻāpana lihi/indents) | ʻAʻohe | ||
ʻōkalakala kua | Ra≤0.2nm (5μm*5μm) | ||
Hōʻailona laser hope | 1 mm (mai ka lihi luna) | ||
Kaulana | |||
Kaulana | Chamfer | ||
Hoʻopili ʻia | |||
Hoʻopili ʻia | Epi-mākaukau me ka hoʻopaʻa ʻumeke Puke cassette nui-wafer | ||
*Nā memo: "NA" ʻo ia hoʻi, ʻaʻohe noi ʻO nā mea i ʻōlelo ʻole ʻia e pili ana i SEMI-STD. |