SiC Epitaxy

ʻO ka wehewehe pōkole:

Hāʻawi ʻo Semicera i kahi kiʻiʻoniʻoni lahilahi maʻamau (silicon carbide) SiC epitaxy ma luna o nā substrate no ka hoʻomohala ʻana i nā mea hana silicon carbide. Ua kūpaʻa ʻo Weitai i ka hāʻawi ʻana i nā huahana maikaʻi a me nā kumukūʻai hoʻokūkū, a ke kakali nei mākou i ka lilo ʻana i hoa pili lōʻihi ma Kina.

 

Huahana Huahana

Huahana Huahana

SiC epitaxy (2)(1)

Hōʻike huahana

4h-n 4 iniha 6 iniha dia100mm sic hua wafer 1mm manoanoa no ka ulu ana

Ka nui maʻamau/2ʻīniha/3ʻīniha/4ʻīniha/6ʻīniha 6H-N/4H-SEMI/ 4H-N SIC ingots/Maʻemaʻe kiʻekiʻe 4H-N 4ʻīniha 6 iniha dia 150mm silicon carbide one crystal (sic) substrates wafersS/ Customzied as-cut sic wafersProduction 4inch papa 4H-N 1.5mm SIC Wafers no ke aniani hua

E pili ana i ka Silicon Carbide (SiC)Crystal

ʻO Silicon carbide (SiC), i ʻike ʻia ʻo carborundum, he semiconductor i loaʻa ke silikoni a me ke kalapona me ke ʻano kemika SiC. Hoʻohana ʻia ʻo SiC i nā mea uila semiconductor e hana ana i nā wela kiʻekiʻe a i ʻole nā ​​​​voltages kiʻekiʻe, a i ʻole nā ​​​​mea ʻelua. nā LED mana.

wehewehe

Waiwai

4H-SiC, Hoʻokahi Crystal

6H-SiC, Hoʻokahi Crystal

Nā ʻāpana Lattice

a=3.076 Å c=10.053 Å

a=3.073 Å c=15.117 Å

Kakau ʻana

ABCB

ABCACB

Mohs Paʻakikī

≈9.2

≈9.2

ʻO ka mānoanoa

3.21 g/cm3

3.21 g/cm3

Therm. Pākuʻi Hoʻonui

4-5×10-6/K

4-5×10-6/K

Papa Hoʻohālua @750nm

ʻaʻole = 2.61
ne = 2.66

ʻaʻole = 2.60
ne = 2.65

Dielectric mau

c~9.66

c~9.66

Hoʻolima wela (N-ʻano, 0.02 ohm.cm)

a~4.2 W/cm·K@298K
c~3.7 W/cm·K@298K

 

ʻO ka hoʻoili wela (Semi-insulating)

a~4.9 W/cm·K@298K
c~3.9 W/cm·K@298K

a~4.6 W/cm·K@298K
c~3.2 W/cm·K@298K

Band-gap

3.23 eV

3.02 eV

Kahua Uila Wehewehe

3-5×106V/cm

3-5×106V/cm

ʻO ka holo holo ʻana o ka Saturation

2.0×105m/s

2.0×105m/s

SiC wafers

Kahi hana Semicera Kahi hana Semicera 2 mīkini lako ʻO ka hana CNN, hoʻomaʻemaʻe kemika, ka uhi CVD ʻO kā mākou lawelawe


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