Hoʻopaʻa ʻia ʻo SiC Focus Ring

Nā Kiʻi Hoʻohanohano ʻia ʻo Solid SiC Focus Ring

ʻO ka wehewehe pōkole:

Hoʻolālā ʻia ʻo Semicera's SiC Etch Rings no nā noi etching semiconductor kiʻekiʻe me ka lōʻihi a me ka pololei. Hana ʻia mai ka silicon carbide (SiC), ʻoi aku ka maikaʻi o kēia apo etch i ka etching plasma, etching maloʻo, a me nā kaʻina hana wafer etching. ʻO ke kaʻina hana kiʻekiʻe o Semicera e hōʻoia i ka hāʻawi ʻana o kēia apo i ke kūpaʻa ʻaʻahu maikaʻi loa a me ke kūpaʻa wela a hiki i nā wahi koi loa. Manaʻo mākou e lilo i hoa pili lōʻihi ma Kina.

E hoʻouna i ka leka uila iā mākou

Huahana Huahana

ʻO ka Solid SiC Focus Ring mai Semicera he mea ʻokiʻoki i hoʻolālā ʻia e hoʻokō i nā koi o ka hana semiconductor holomua. Hana ʻia mai ka maʻemaʻe kiʻekiʻeKapili Silika (SiC), He mea kūpono kēia apo maka no ka nui o nā noi i ka ʻoihana semiconductor, ʻoi aku hoʻi maNā hana CVD SiC, etching plasma, aICPRIE (Inductively Coupled Plasma Reactive Ion Etching). ʻIke ʻia no kona kūpaʻa ʻokoʻa, kūpaʻa wela kiʻekiʻe, a me ka maʻemaʻe, e hōʻoiaʻiʻo i ka hana lōʻihi i nā kaiapuni kiʻekiʻe.

I ka semiconductorwaferka hana ʻana, ʻo Solid SiC Focus Rings he mea koʻikoʻi i ka mālama ʻana i ka etching pololei i ka wā etching maloʻo a me nā noi wafer etching. Kōkua ke apo kiko SiC i ka nānā ʻana i ka plasma i ka wā o nā kaʻina hana e like me ka hana ʻana o ka mīkini etching plasma, no laila he mea nui ia no ka etching o nā wafer silika. Hāʻawi ka mea SiC paʻa i ke kūpaʻa like ʻole i ka erosion, e hōʻoiaʻiʻo ana i ka lōʻihi o kāu mau mea hana a me ka hōʻemi ʻana i ka manawa haʻahaʻa, he mea nui ia no ka mālama ʻana i ka hana kiʻekiʻe i ka hana semiconductor.

Hoʻokumu ʻia ka Solid SiC Focus Ring mai Semicera e pale aku i nā wela wela a me nā kemika koʻikoʻi i ʻike pinepine ʻia i ka ʻoihana semiconductor. Hana ʻia ia no ka hoʻohana ʻana i nā hana kiʻekiʻe e like meʻO nā pale CVD SiC, kahi o ka ma'ema'e a me ka lō'ihi. Me ke kūpaʻa maikaʻi loa i ka haʻalulu wela, hōʻoia kēia huahana i ka hana paʻa a paʻa ma lalo o nā kūlana koʻikoʻi, me ka ʻike ʻana i nā wela kiʻekiʻe i ka wāwafernā hana etching.

Ma nā noi semiconductor, kahi mea nui ka pololei a me ka hilinaʻi, ʻo ka Solid SiC Focus Ring ka mea nui i ka hoʻonui ʻana i ka pono holoʻokoʻa o nā kaʻina hana etching. ʻO kāna hoʻolālā paʻa, hana kiʻekiʻe ka mea i koho maikaʻi loa no nā ʻoihana e koi ana i nā mea hoʻomaʻemaʻe kiʻekiʻe e hana ana ma lalo o nā kūlana koʻikoʻi. Inā hoʻohana ʻia maapo CVD SiCnā noi a i ʻole he ʻāpana o ke kaʻina hana etching plasma, kōkua ʻo Semicera's Solid SiC Focus Ring i ka hoʻokō ʻana i ka hana o kāu mea hana, e hāʻawi ana i ka lōʻihi a me ka hilinaʻi o kāu mau kaʻina hana.

Nā mea nui:

• ʻOi aku ka maikaʻi o ka ʻaʻahu a me ke kūpaʻa wela kiʻekiʻe
• Mea hoʻomaʻemaʻe kiʻekiʻe Solid SiC no ka lōʻihi o ke ola
• He kūpono no ka etching plasma, ICP RIE, a me nā noi etching maloʻo
• Pono no ka wafer etching, ʻoi aku ma nā kaʻina hana CVD SiC
• Hoʻokō hilinaʻi ma nā kaiapuni koʻikoʻi a me nā wela kiʻekiʻe
• E hōʻoia i ka pololei a me ka pono i ka etching o nā wafer silika

Nā noi:

• nā hana CVD SiC i ka hana semiconductor
• Nā ʻōnaehana plasma a me ICP RIE
• ka hana ili maloo a me ka wafer etching
• Hoʻopili a waiho ʻia i nā mīkini etching plasma
• Nā ʻāpana pololei no nā apo wafer a me nā apo CVD SiC