Silika ma ka insulator wafer

ʻO ka wehewehe pōkole:

Hāʻawi ʻo Semicera's Silicon On Insulator (SOI) Wafer i kahi kaʻawale uila a me ka hoʻokele wela no nā noi hana kiʻekiʻe. Hoʻolālā ʻia e hāʻawi i ka pono a me ka hilinaʻi ʻoi aku ka maikaʻi, ʻo kēia mau wafers kahi koho nui no ka ʻenehana semiconductor kiʻekiʻe. E koho iā Semicera no nā ʻōhua wafer SOI.


Huahana Huahana

Huahana Huahana

ʻO Semicera's Silicon On Insulator (SOI) Wafer ka mea mua o ka hana hou semiconductor, e hāʻawi ana i ka hoʻokaʻawale uila i hoʻonui ʻia a me ka hana wela maikaʻi. ʻO ka hoʻolālā SOI, i loaʻa i kahi papa silika lahilahi ma kahi substrate insulating, hāʻawi i nā pono koʻikoʻi no nā mea uila hana kiʻekiʻe.

Hoʻolālā ʻia kā mākou mau wafers SOI e hōʻemi i ka capacitance parasitic a me nā au leakage, he mea nui ia no ka hoʻomohala ʻana i nā kaapuni hoʻohui kiʻekiʻe a me ka mana haʻahaʻa. ʻO kēia ʻenehana holomua e hōʻoia i ka hana ʻoi aku ka maikaʻi o nā hāmeʻa, me ka wikiwiki a me ka hoʻemi ʻana i ka ikehu, koʻikoʻi no nā uila uila hou.

ʻO nā kaʻina hana kiʻekiʻe i hoʻohana ʻia e Semicera e hōʻoiaʻiʻo i ka hana ʻana o nā wafers SOI me ka kūlike a me ka kūlike. He mea koʻikoʻi kēia ʻano no nā noi ma ke kelepona, automotive, a me nā mea hoʻohana uila, kahi e pono ai nā ʻāpana hilinaʻi a kiʻekiʻe.

Ma waho aʻe o kā lākou mau pono uila, hāʻawi ka Semicera's SOI wafers i ka insulation thermal kiʻekiʻe, e hoʻonui ana i ka hoʻoheheʻe wela a me ka paʻa i nā mea kiʻekiʻe a me nā mana kiʻekiʻe. He waiwai nui kēia hiʻohiʻona i nā noi e pili ana i ka hana wela nui a koi i ka hoʻokele wela kūpono.

Ma ke koho ʻana iā Semicera's Silicon On Insulator Wafer, hoʻopukapuka ʻoe i kahi huahana e kākoʻo ana i ka holomua o nā ʻenehana ʻokiʻoki. ʻO kā mākou kūpaʻa i ka maikaʻi a me ka hana hou e hōʻoia i ka hoʻokō ʻana o kā mākou wafer SOI i nā koi koʻikoʻi o ka ʻoihana semiconductor o kēia lā, e hāʻawi ana i ke kumu no nā mea uila e hiki mai ana.

Nā mea

Paahana

Ka noiʻi

Dummy

Nā Kūlana Crystal

Polytype

4H

Ua hewa ka hoʻonohonoho ʻana o ka ʻili

<11-20 >4±0.15°

Nā Kūlana Uila

Dopant

n-ʻano Nitrogen

Kū'ē

0.015-0.025ohm·cm

Nā Kūlana Mechanical

Anawaena

150.0±0.2mm

mānoanoa

350±25 μm

Kūlana pālahalaha mua

[1-100]±5°

Ka lōʻihi pālahalaha mua

47.5±1.5mm

palahalaha lua

ʻAʻohe

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm(5mm*5mm)

≤5 μm(5mm*5mm)

≤10 μm(5mm*5mm)

Kakaka

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

Warp

≤35 μm

≤45 μm

≤55 μm

'Oka (AFM) mua (Si-maka)

Ra≤0.2nm (5μm*5μm)

Hoʻolālā

Micropipe mānoanoa

<1 ea/cm2

<10 ea/cm2

<15 ea/cm2

Metala haumia

≤5E10atoms/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

ʻAno o mua

Imua

Si

Hoʻopau ʻili

Si-maka CMP

Nā ʻāpana

≤60ea/wafer (nui≥0.3μm)

NA

Nā ʻōpala

≤5ea/mm. Ka lōʻihi huila ≤Diameter

ʻO ka lōʻihi huila≤2*Diameter

NA

ʻAlani ʻili/mau lua/ʻeleʻele/striations/ māwae/contamination

ʻAʻohe

NA

Nā ʻāpana lihi/indents/fracture/papa hex

ʻAʻohe

Nā wahi polytype

ʻAʻohe

ʻĀpana huila≤20%

ʻĀpana huila≤30%

Hōʻailona laser mua

ʻAʻohe

ʻAno o hope

Hoʻopau hope

C-maka CMP

Nā ʻōpala

≤5ea / mm, Ka lōʻihi huila≤2 * Anawaena

NA

Nā hemahema o hope (nā ʻāpana lihi/indents)

ʻAʻohe

ʻōkalakala kua

Ra≤0.2nm (5μm*5μm)

Hōʻailona laser hope

1 mm (mai ka lihi luna)

Kaulana

Kaulana

Chamfer

Hoʻopili ʻia

Hoʻopili ʻia

Epi-mākaukau me ka hoʻopaʻa ʻumeke

Puke cassette nui-wafer

*Nā memo: "NA" ʻo ia hoʻi, ʻaʻohe noi ʻO nā mea i ʻōlelo ʻole ʻia e pili ana i SEMI-STD.

tech_1_2_size
SiC wafers

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