Silika ma luna o ka insulator wafersmai Semicera ua hoʻolālā ʻia e hoʻokō i ka ulu nui o ka noi no nā hoʻonā semiconductor kiʻekiʻe. Hāʻawi kā mākou wafers SOI i ka hana uila ʻoi aku ka maikaʻi a me ka hoʻohaʻahaʻa ʻana i ka capacitance device parasitic, e hoʻolilo iā lākou i mea kūpono no nā noi holomua e like me nā polokalamu MEMS, sensor, a me nā kaapuni hoʻohui. ʻO ko Semicera akamai i ka hana wafer e hōʻoia i kēlā me kēiaSOI waferhāʻawi i nā hualoaʻa hilinaʻi, kūlana kiʻekiʻe no kāu pono ʻenehana o ka hanauna e hiki mai ana.
ʻO kā mākouSilika ma luna o ka insulator wafershāʻawi i kahi kaulike maikaʻi ma waena o ka uku-pono a me ka hana. Me ka piʻi ʻana o ka hoʻokūkū soi wafer, hoʻohana nui ʻia kēia mau wafers i nā ʻano ʻoihana, me ka microelectronics a me ka optoelectronics. ʻO ke kaʻina hana hana kiʻekiʻe o Semicera e hōʻoiaʻiʻo i ka paʻa ʻana o ka wafer maikaʻi a me ka like ʻole, e kūpono ana iā lākou no nā ʻano noi like ʻole, mai nā wafers SOI cavity a i nā wafer silika maʻamau.
Nā mea nui:
•Hoʻolālā ʻia nā wafers SOI kiʻekiʻe no ka hana ma MEMS a me nā noi ʻē aʻe.
•ʻO ke kumu kūʻai soi wafer hoʻokūkū no nā ʻoihana e ʻimi nei i nā hoʻonā holomua me ka ʻole e hōʻemi i ka maikaʻi.
•He kūpono no nā ʻenehana ʻokiʻoki, hāʻawi i ka hoʻokaʻawale uila i hoʻonui ʻia a me ka maikaʻi ma ke silikona ma nā ʻōnaehana insulator.
ʻO kā mākouSilika ma luna o ka insulator wafersua hoʻolālā ʻia e hāʻawi i nā hāʻina hana kiʻekiʻe, e kākoʻo ana i ka nalu o ka hana hou i ka ʻenehana semiconductor. Inā ʻoe e hana ana ma ka luaSOI wafers, nā mea MEMS, a i ʻole silika ma nā ʻāpana insulator, hāʻawi ʻo Semicera i nā wafers i kūpono i nā kūlana kiʻekiʻe o ka ʻoihana.
Nā mea | Paahana | Ka noiʻi | Dummy |
Nā Kūlana Crystal | |||
Polytype | 4H | ||
Ua hewa ka hoʻonohonoho ʻana o ka ʻili | <11-20 >4±0.15° | ||
Nā Kūlana Uila | |||
Dopant | n-ʻano Nitrogen | ||
Kū'ē | 0.015-0.025ohm·cm | ||
Nā Kūlana Mechanical | |||
Anawaena | 150.0±0.2mm | ||
mānoanoa | 350±25 μm | ||
Kūlana pālahalaha mua | [1-100]±5° | ||
Ka lōʻihi pālahalaha mua | 47.5±1.5mm | ||
palahalaha lua | ʻAʻohe | ||
TTV | ≤5 μm | ≤10 μm | ≤15 μm |
LTV | ≤3 μm(5mm*5mm) | ≤5 μm(5mm*5mm) | ≤10 μm(5mm*5mm) |
Kakaka | -15μm ~ 15μm | -35μm ~ 35μm | -45μm ~ 45μm |
Warp | ≤35 μm | ≤45 μm | ≤55 μm |
'Oka (AFM) mua (Si-maka) | Ra≤0.2nm (5μm*5μm) | ||
Hoʻolālā | |||
Micropipe mānoanoa | <1 ea/cm2 | <10 ea/cm2 | <15 ea/cm2 |
Metala haumia | ≤5E10atoms/cm2 | NA | |
BPD | ≤1500 ea/cm2 | ≤3000 ea/cm2 | NA |
TSD | ≤500 ea/cm2 | ≤1000 ea/cm2 | NA |
ʻAno o mua | |||
Imua | Si | ||
Hoʻopau ʻili | Si-maka CMP | ||
Nā ʻāpana | ≤60ea/wafer (nui≥0.3μm) | NA | |
Nā ʻōpala | ≤5ea/mm. Ka lōʻihi huila ≤Diameter | ʻO ka lōʻihi huila≤2*Diameter | NA |
ʻAlani ʻili/mau lua/ʻeleʻele/striations/ māwae/contamination | ʻAʻohe | NA | |
Nā ʻāpana lihi/indents/fracture/papa hex | ʻAʻohe | ||
Nā wahi polytype | ʻAʻohe | ʻĀpana huila≤20% | ʻĀpana huila≤30% |
Hōʻailona laser mua | ʻAʻohe | ||
ʻAno o hope | |||
Hoʻopau hope | C-maka CMP | ||
Nā ʻōpala | ≤5ea / mm, Ka lōʻihi huila≤2 * Anawaena | NA | |
Nā pōʻino hope (nā ʻāpana lihi/indents) | ʻAʻohe | ||
ʻōkalakala kua | Ra≤0.2nm (5μm*5μm) | ||
Hōʻailona laser hope | 1 mm (mai ka lihi luna) | ||
Kaulana | |||
Kaulana | Chamfer | ||
Hoʻopili ʻia | |||
Hoʻopili ʻia | Epi-mākaukau me ka hoʻopaʻa ʻumeke Puke cassette nui-wafer | ||
*Nā memo: "NA" ʻo ia hoʻi, ʻaʻohe noi ʻO nā mea i ʻōlelo ʻole ʻia e pili ana i SEMI-STD. |