SiN Ceramics Plain Substrates

ʻO ka wehewehe pōkole:

Hāʻawi ka Semicera's SiN Ceramics Plain Substrates i ka hana wela a me ka mechanical no nā noi koi nui. Hoʻolālā ʻia no ka lōʻihi a me ka hilinaʻi maikaʻi, kūpono kēia mau substrate no nā mea uila kiʻekiʻe. E koho iā Semicera no nā hoʻonā SiN ceramic kiʻekiʻe i kūpono i kāu mau pono.


Huahana Huahana

Huahana Huahana

Hāʻawi ʻo Semicera's SiN Ceramics Plain Substrates i kahi hopena hoʻokō kiʻekiʻe no nā ʻano mea uila a me nā noi ʻoihana. ʻIke ʻia no kā lākou conductivity thermal maikaʻi loa a me ka ikaika mechanical, ʻo kēia mau substrates e hōʻoia i ka hana pono i nā wahi koi.

Hoʻolālā ʻia kā mākou SiN (Silicon Nitride) ceramics no ka mālama ʻana i nā mahana wela a me nā kūlana koʻikoʻi kiʻekiʻe, e kūpono ana iā lākou no nā uila uila kiʻekiʻe a me nā mea semiconductor kiʻekiʻe. ʻO ko lākou kūpaʻa a me ke kūpaʻa ʻana i ka haʻalulu wela e kūpono iā lākou no ka hoʻohana ʻana i nā noi kahi koʻikoʻi ka hilinaʻi a me ka hana.

ʻO nā kaʻina hana pololei a Semicera e hōʻoia i kēlā me kēia substrate maʻemaʻe e hoʻokō i nā kūlana koʻikoʻi. Loaʻa kēia i nā substrate me ka mānoanoa like ʻole a me ka maikaʻi o ka ʻili, he mea nui ia no ka hoʻokō ʻana i ka hana maikaʻi loa i nā hui uila a me nā ʻōnaehana.

Ma kahi o kā lākou mau mea wela a me ka mīkini, hāʻawi ʻo SiN Ceramics Plain Substrates i nā waiwai insulation uila maikaʻi loa. Mālama kēia i ka liʻiliʻi liʻiliʻi o ka uila a hāʻawi i ka paʻa holoʻokoʻa a me ka pono o nā mea uila, e hoʻonui i ko lākou ola hana.

Ma ke koho ʻana iā Semicera's SiN Ceramics Plain Substrates, ke koho nei ʻoe i kahi huahana e hoʻohui i ka ʻepekema waiwai holomua me ka hana kiʻekiʻe. ʻO kā mākou kūpaʻa i ka maikaʻi a me ka hana hou e hōʻoiaʻiʻo e loaʻa iā ʻoe nā substrate e kū ana i nā kūlana ʻoihana kiʻekiʻe loa a kākoʻo i ka kūleʻa o kāu mau papahana ʻenehana holomua.

Nā mea

Paahana

Ka noiʻi

Dummy

Nā Kūlana Crystal

Polytype

4H

Ua hewa ka hoʻonohonoho ʻana o ka ʻili

<11-20 >4±0.15°

Nā Kūlana Uila

Dopant

n-ʻano Nitrogen

Kū'ē

0.015-0.025ohm·cm

Nā Kūlana Mechanical

Anawaena

150.0±0.2mm

mānoanoa

350±25 μm

Kūlana pālahalaha mua

[1-100]±5°

Ka lōʻihi pālahalaha mua

47.5±1.5mm

palahalaha lua

ʻAʻohe

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm(5mm*5mm)

≤5 μm(5mm*5mm)

≤10 μm(5mm*5mm)

Kakaka

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

Warp

≤35 μm

≤45 μm

≤55 μm

'Oka (AFM) mua (Si-maka)

Ra≤0.2nm (5μm*5μm)

Hoʻolālā

Micropipe mānoanoa

<1 ea/cm2

<10 ea/cm2

<15 ea/cm2

Metala haumia

≤5E10atoms/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

ʻAno o mua

Imua

Si

Hoʻopau ʻili

Si-maka CMP

Nā ʻāpana

≤60ea/wafer (nui≥0.3μm)

NA

Nā ʻōpala

≤5ea/mm. Ka lōʻihi huila ≤Diameter

ʻO ka lōʻihi huila≤2*Diameter

NA

ʻAlani ʻili/mau lua/ʻeleʻele/striations/ māwae/contamination

ʻAʻohe

NA

Nā ʻāpana lihi/indents/fracture/papa hex

ʻAʻohe

Nā wahi polytype

ʻAʻohe

ʻĀpana huila≤20%

ʻĀpana huila≤30%

Hōʻailona laser mua

ʻAʻohe

ʻAno o hope

Hoʻopau hope

C-maka CMP

Nā ʻōpala

≤5ea / mm, Ka lōʻihi huila≤2 * Anawaena

NA

Nā hemahema o hope (nā ʻāpana lihi/indents)

ʻAʻohe

ʻōkalakala kua

Ra≤0.2nm (5μm*5μm)

Hōʻailona laser hope

1 mm (mai ka lihi luna)

Kaulana

Kaulana

Chamfer

Hoʻopili ʻia

Hoʻopili ʻia

Epi-mākaukau me ka hoʻopaʻa ʻumeke

Puke cassette nui-wafer

*Nā memo: "NA" ʻo ia hoʻi, ʻaʻohe noi ʻO nā mea i ʻōlelo ʻole ʻia e pili ana i SEMI-STD.

tech_1_2_size
SiC wafers

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