Hāʻawi ʻo Semicera's SiN Ceramics Plain Substrates i kahi hopena hoʻokō kiʻekiʻe no nā ʻano mea uila a me nā noi ʻoihana. ʻIke ʻia no kā lākou conductivity thermal maikaʻi loa a me ka ikaika mechanical, ʻo kēia mau substrates e hōʻoia i ka hana pono i nā wahi koi.
Hoʻolālā ʻia kā mākou SiN (Silicon Nitride) ceramics no ka mālama ʻana i nā mahana wela a me nā kūlana koʻikoʻi kiʻekiʻe, e kūpono ana iā lākou no nā uila uila kiʻekiʻe a me nā mea semiconductor kiʻekiʻe. ʻO ko lākou kūpaʻa a me ke kūpaʻa ʻana i ka haʻalulu wela e kūpono iā lākou no ka hoʻohana ʻana i nā noi kahi koʻikoʻi ka hilinaʻi a me ka hana.
ʻO nā kaʻina hana pololei a Semicera e hōʻoia i kēlā me kēia substrate maʻemaʻe e hoʻokō i nā kūlana koʻikoʻi. Loaʻa kēia i nā substrate me ka mānoanoa like ʻole a me ka maikaʻi o ka ʻili, he mea nui ia no ka hoʻokō ʻana i ka hana maikaʻi loa i nā hui uila a me nā ʻōnaehana.
Ma kahi o kā lākou mau mea wela a me ka mīkini, hāʻawi ʻo SiN Ceramics Plain Substrates i nā waiwai insulation uila maikaʻi loa. Mālama kēia i ka liʻiliʻi liʻiliʻi o ka uila a hāʻawi i ka paʻa holoʻokoʻa a me ka pono o nā mea uila, e hoʻonui i ko lākou ola hana.
Ma ke koho ʻana iā Semicera's SiN Ceramics Plain Substrates, ke koho nei ʻoe i kahi huahana e hoʻohui i ka ʻepekema waiwai holomua me ka hana kiʻekiʻe. ʻO kā mākou kūpaʻa i ka maikaʻi a me ka hana hou e hōʻoiaʻiʻo e loaʻa iā ʻoe nā substrate e kū ana i nā kūlana ʻoihana kiʻekiʻe loa a kākoʻo i ka kūleʻa o kāu mau papahana ʻenehana holomua.
Nā mea | Paahana | Ka noiʻi | Dummy |
Nā Kūlana Crystal | |||
Polytype | 4H | ||
Ua hewa ka hoʻonohonoho ʻana o ka ʻili | <11-20 >4±0.15° | ||
Nā Kūlana Uila | |||
Dopant | n-ʻano Nitrogen | ||
Kū'ē | 0.015-0.025ohm·cm | ||
Nā Kūlana Mechanical | |||
Anawaena | 150.0±0.2mm | ||
mānoanoa | 350±25 μm | ||
Kūlana pālahalaha mua | [1-100]±5° | ||
Ka lōʻihi pālahalaha mua | 47.5±1.5mm | ||
palahalaha lua | ʻAʻohe | ||
TTV | ≤5 μm | ≤10 μm | ≤15 μm |
LTV | ≤3 μm(5mm*5mm) | ≤5 μm(5mm*5mm) | ≤10 μm(5mm*5mm) |
Kakaka | -15μm ~ 15μm | -35μm ~ 35μm | -45μm ~ 45μm |
Warp | ≤35 μm | ≤45 μm | ≤55 μm |
'Oka (AFM) mua (Si-maka) | Ra≤0.2nm (5μm*5μm) | ||
Hoʻolālā | |||
Micropipe mānoanoa | <1 ea/cm2 | <10 ea/cm2 | <15 ea/cm2 |
Metala haumia | ≤5E10atoms/cm2 | NA | |
BPD | ≤1500 ea/cm2 | ≤3000 ea/cm2 | NA |
TSD | ≤500 ea/cm2 | ≤1000 ea/cm2 | NA |
ʻAno o mua | |||
Imua | Si | ||
Hoʻopau ʻili | Si-maka CMP | ||
Nā ʻāpana | ≤60ea/wafer (nui≥0.3μm) | NA | |
Nā ʻōpala | ≤5ea/mm. Ka lōʻihi huila ≤Diameter | ʻO ka lōʻihi huila≤2*Diameter | NA |
ʻAlani ʻili/mau lua/ʻeleʻele/striations/ māwae/contamination | ʻAʻohe | NA | |
Nā ʻāpana lihi/indents/fracture/papa hex | ʻAʻohe | ||
Nā wahi polytype | ʻAʻohe | ʻĀpana huila≤20% | ʻĀpana huila≤30% |
Hōʻailona laser mua | ʻAʻohe | ||
ʻAno o hope | |||
Hoʻopau hope | C-maka CMP | ||
Nā ʻōpala | ≤5ea / mm, Ka lōʻihi huila≤2 * Anawaena | NA | |
Nā hemahema o hope (nā ʻāpana lihi/indents) | ʻAʻohe | ||
ʻōkalakala kua | Ra≤0.2nm (5μm*5μm) | ||
Hōʻailona laser hope | 1 mm (mai ka lihi luna) | ||
Kaulana | |||
Kaulana | Chamfer | ||
Hoʻopili ʻia | |||
Hoʻopili ʻia | Epi-mākaukau me ka hoʻopaʻa ʻumeke Puke cassette nui-wafer | ||
*Nā memo: "NA" ʻo ia hoʻi, ʻaʻohe noi ʻO nā mea i ʻōlelo ʻole ʻia e pili ana i SEMI-STD. |