Hoʻolālā ʻia ʻo Semicera's SOI Wafer (Silicon On Insulator) e hāʻawi i ka hoʻokaʻawale uila a me ka hana wela. ʻO kēia ʻano hana wafer hou, e hōʻike ana i kahi papa silika ma kahi papa insulating, e hōʻoia i ka hoʻonui ʻana i ka hana a me ka hoʻemi ʻana i ka hoʻohana ʻana i ka mana, e kūpono ia no nā ʻano noiʻi kiʻekiʻe.
Hāʻawi kā mākou wafers SOI i nā pōmaikaʻi kūikawā no nā kaapuni i hoʻohui ʻia ma o ka hoʻemi ʻana i ka capacitance parasitic a me ka hoʻomaikaʻi ʻana i ka wikiwiki a me ka pono. He mea koʻikoʻi kēia no nā uila uila hou, kahi e pono ai ka hana kiʻekiʻe a me ka ikaika o ka ikehu no nā mea kūʻai aku a me nā noi ʻoihana.
Hoʻohana ʻo Semicera i nā ʻenehana hana kiʻekiʻe e hana i nā wafers SOI me ka maikaʻi a me ka hilinaʻi. Hāʻawi kēia mau wafers i ka insulation thermal maikaʻi loa, e kūpono iā lākou no ka hoʻohana ʻana i nā kaiapuni kahi e hopohopo ai ka wela, e like me nā mea uila uila kiʻekiʻe a me nā ʻōnaehana hoʻokele mana.
ʻO ka hoʻohana ʻana i nā wafers SOI i ka hana semiconductor e hiki ai ke hoʻomohala i nā ʻāpana liʻiliʻi, wikiwiki, a ʻoi aku ka hilinaʻi. ʻO ka hoʻokō ʻana o Semicera i ka ʻenehana kikoʻī e hōʻoia i ko mākou mau wafers SOI e hoʻokō i nā kūlana kiʻekiʻe i koi ʻia no nā ʻenehana ʻokiʻoki i nā kula e like me ke kelepona, kaʻa, a me nā mea uila.
ʻO ke koho ʻana i kā Semicera's SOI Wafer ʻo ia hoʻi ka hoʻopukapuka ʻana i kahi huahana e kākoʻo ana i ka holomua o nā ʻenehana uila a me microelectronic. Hoʻolālā ʻia kā mākou mau wafers e hāʻawi i ka hana i hoʻonui ʻia a me ka lōʻihi, e hāʻawi ana i ka kūleʻa o kāu mau papahana ʻenehana kiʻekiʻe a me ka hōʻoia ʻana e noho ʻoe ma ke alo o ka hana hou.
Nā mea | Paahana | Ka noiʻi | Dummy |
Nā Kūlana Crystal | |||
Polytype | 4H | ||
Ua hewa ka hoʻonohonoho ʻana o ka ʻili | <11-20 >4±0.15° | ||
Nā Kūlana Uila | |||
Dopant | n-ʻano Nitrogen | ||
Kū'ē | 0.015-0.025ohm·cm | ||
Nā Kūlana Mechanical | |||
Anawaena | 150.0±0.2mm | ||
mānoanoa | 350±25 μm | ||
Kūlana pālahalaha mua | [1-100]±5° | ||
Ka lōʻihi pālahalaha mua | 47.5±1.5mm | ||
palahalaha lua | ʻAʻohe | ||
TTV | ≤5 μm | ≤10 μm | ≤15 μm |
LTV | ≤3 μm(5mm*5mm) | ≤5 μm(5mm*5mm) | ≤10 μm(5mm*5mm) |
Kakaka | -15μm ~ 15μm | -35μm ~ 35μm | -45μm ~ 45μm |
Warp | ≤35 μm | ≤45 μm | ≤55 μm |
'Oka (AFM) mua (Si-maka) | Ra≤0.2nm (5μm*5μm) | ||
Hoʻolālā | |||
Micropipe mānoanoa | <1 ea/cm2 | <10 ea/cm2 | <15 ea/cm2 |
Metala haumia | ≤5E10atoms/cm2 | NA | |
BPD | ≤1500 ea/cm2 | ≤3000 ea/cm2 | NA |
TSD | ≤500 ea/cm2 | ≤1000 ea/cm2 | NA |
ʻAno o mua | |||
Imua | Si | ||
Hoʻopau ʻili | Si-maka CMP | ||
Nā ʻāpana | ≤60ea/wafer (nui≥0.3μm) | NA | |
Nā ʻōpala | ≤5ea/mm. Ka lōʻihi huila ≤Diameter | ʻO ka lōʻihi huila≤2*Diameter | NA |
ʻAlani ʻili/mau lua/ʻeleʻele/striations/ māwae/contamination | ʻAʻohe | NA | |
Nā ʻāpana lihi/indents/fracture/papa hex | ʻAʻohe | ||
Nā wahi polytype | ʻAʻohe | ʻĀpana huila≤20% | ʻĀpana huila≤30% |
Hōʻailona laser mua | ʻAʻohe | ||
ʻAno o hope | |||
Hoʻopau hope | C-maka CMP | ||
Nā ʻōpala | ≤5ea / mm, Ka lōʻihi huila≤2 * Anawaena | NA | |
Nā pōʻino hope (nā ʻāpana lihi/indents) | ʻAʻohe | ||
ʻōkalakala kua | Ra≤0.2nm (5μm*5μm) | ||
Hōʻailona laser hope | 1 mm (mai ka lihi luna) | ||
Kaulana | |||
Kaulana | Chamfer | ||
Hoʻopili ʻia | |||
Hoʻopili ʻia | Epi-mākaukau me ka hoʻopaʻa ʻumeke Puke cassette nui-wafer | ||
*Nā memo: "NA" ʻo ia hoʻi, ʻaʻohe noi ʻO nā mea i ʻōlelo ʻole ʻia e pili ana i SEMI-STD. |