ka uhi ʻana o TaChe mea hoʻouhi mea nui, i hoʻomākaukau mau ʻia ma luna o kahi kumu graphite e ka ʻenehana metala organik chemical vapor deposition (MOCVD). He mau waiwai maikaʻi loa kēia uhi, e like me ka paʻakikī kiʻekiʻe, ke kūpaʻa ʻana i ka lole maikaʻi, ke kūpaʻa wela kiʻekiʻe a me ka paʻa kemika, a kūpono ia no nā noi ʻenehana kiʻekiʻe.
ʻO ka ʻenehana MOCVD kahi ʻenehana hoʻoulu kiʻiʻoniʻoni lahilahi e waiho ana i ka kiʻiʻoniʻoni i makemake ʻia ma luna o ka ʻili o ka substrate ma o ka hoʻopili ʻana i nā mea mua metala me nā kinoea reactive i nā wela kiʻekiʻe. I ka hoomakaukau anaka uhi ʻana o TaC, ke koho ʻana i nā mea mua metala kūpono a me nā kumu kalapona, ka hoʻomalu ʻana i nā kūlana hopena a me nā ʻāpana deposition, hiki ke waiho ʻia kahi kiʻiʻoniʻoni TaC ʻaʻahu a paʻa i kahi kumu graphite.
Hāʻawi ʻo Semicera i nā ʻāpana tantalum carbide (TaC) kūikawā no nā ʻāpana like ʻole a me nā mea lawe.ʻO ke kaʻina hana hoʻopili alakaʻi Semicera e hiki ai i ka tantalum carbide (TaC) ke hoʻokō i ka maʻemaʻe kiʻekiʻe, ke kūpaʻa wela kiʻekiʻe a me ka hoʻomanawanui kiʻekiʻe, e hoʻomaikaʻi i ka maikaʻi o ka huahana o nā kristal SIC / GAN a me nā papa EPI (Kāpena ʻo TaC i uhi ʻia i ka graphite), a hoʻonui i ke ola o nā ʻāpana reactor koʻikoʻi. ʻO ka hoʻohana ʻana i ka tantalum carbide TaC coating ka mea e hoʻoponopono ai i ka pilikia lihi a hoʻomaikaʻi i ka maikaʻi o ka ulu ʻana o ke aniani, a ua hoʻopau ʻo Semicera i ka ʻenehana tantalum carbide coating (CVD), a hiki i ka pae kiʻekiʻe honua.
Ma hope o nā makahiki o ka hoʻomohala ʻana, ua lanakila ʻo Semicera i ka ʻenehana oCVD TaCme ka hooikaika pu ana o ka oihana R&D. He mea maʻalahi nā hemahema i ka ulu ʻana o nā wafers SiC, akā ma hope o ka hoʻohana ʻanaTaC, nui ka ʻokoʻa. Ma lalo iho nei ka hoʻohālikelike ʻana o nā wafers me ka TaC a me ka ʻole o TaC, a me nā ʻāpana ʻo Simicera 'no ka ulu aniani hoʻokahi.
me ka TaC ole
Ma hope o ka hoʻohana ʻana iā TaC (ʻākau)
Eia kekahi, ʻo SemiceraNā huahana i uhi ʻia e TaChōʻike i kahi ola lawelawe lōʻihi a ʻoi aku ka nui o ke kūpaʻa wela kiʻekiʻe i hoʻohālikelike ʻia meʻO nā uhi SiC.Ua hōʻike ʻia nā ana Laboratory i kā mākouʻO nā pale TaChiki ke hana mau i ka wela a hiki i 2300 degere Celsius no nā manawa lōʻihi. Aia ma lalo kekahi mau laʻana o kā mākou mau laʻana:
