ʻO Semicera's 4 Inch N-type SiC Substrates i hana ʻia e hoʻokō i nā kūlana kūpono o ka ʻoihana semiconductor. Hāʻawi kēia mau substrates i kahi kumu hana kiʻekiʻe no kahi ākea o nā noi uila, e hāʻawi ana i ka conductivity kūikawā a me nā waiwai wela.
ʻO ka doping N-type o kēia mau substrates SiC e hoʻonui i kā lākou conductivity uila, e kūpono loa iā lākou no nā noi kiʻekiʻe a me nā alapine kiʻekiʻe. Hāʻawi kēia waiwai i ka hana maikaʻi o nā mea like me nā diodes, transistors, a me nā mea hoʻonui, kahi e hoʻemi ai i ka nalowale o ka ikehu.
Hoʻohana ʻo Semicera i nā kaʻina hana hou no ka hōʻoia ʻana i kēlā me kēia substrate e hōʻike i ka maikaʻi o ka ʻili a me ka lokahi. He mea koʻikoʻi kēia kikoʻī no nā noi i ka uila uila, nā mīkini microwave, a me nā ʻenehana ʻē aʻe e koi ana i ka hana hilinaʻi ma lalo o nā kūlana koʻikoʻi.
ʻO ka hoʻokomo ʻana i nā substrate SiC N-type ʻo Semicera i kāu laina hana ʻo ia ka pōmaikaʻi mai nā mea e hāʻawi ana i ka hoʻoheheʻe wela ʻoi aku ka maikaʻi a me ke kūpaʻa uila. He kūpono kēia mau substrate no ka hana ʻana i nā mea e pono ai ka lōʻihi a me ka pono, e like me nā ʻōnaehana hoʻololi mana a me nā mea hoʻonui RF.
Ma ke koho ʻana i kā Semicera's 4 Inch N-type SiC Substrates, ke kālele nei ʻoe i kahi huahana e hoʻohui i ka ʻepekema waiwai hou me ka hana akamai. Ke hoʻomau nei ʻo Semicera i ke alakaʻi ʻana i ka ʻoihana ma o ka hāʻawi ʻana i nā hāʻina e kākoʻo i ka hoʻomohala ʻana i nā ʻenehana semiconductor ʻokiʻoki, e hōʻoia ana i ka hana kiʻekiʻe a me ka hilinaʻi.
Nā mea | Paahana | Ka noiʻi | Dummy |
Nā Kūlana Crystal | |||
Polytype | 4H | ||
Ua hewa ka hoʻonohonoho ʻana o ka ʻili | <11-20 >4±0.15° | ||
Nā Kūlana Uila | |||
Dopant | n-ʻano Nitrogen | ||
Kū'ē | 0.015-0.025ohm·cm | ||
Nā Kūlana Mechanical | |||
Anawaena | 150.0±0.2mm | ||
mānoanoa | 350±25 μm | ||
Kūlana pālahalaha mua | [1-100]±5° | ||
Ka lōʻihi pālahalaha mua | 47.5±1.5mm | ||
palahalaha lua | ʻAʻohe | ||
TTV | ≤5 μm | ≤10 μm | ≤15 μm |
LTV | ≤3 μm(5mm*5mm) | ≤5 μm(5mm*5mm) | ≤10 μm(5mm*5mm) |
Kakaka | -15μm ~ 15μm | -35μm ~ 35μm | -45μm ~ 45μm |
Warp | ≤35 μm | ≤45 μm | ≤55 μm |
'Oka (AFM) mua (Si-maka) | Ra≤0.2nm (5μm*5μm) | ||
Hoʻolālā | |||
Micropipe mānoanoa | <1 ea/cm2 | <10 ea/cm2 | <15 ea/cm2 |
Metala haumia | ≤5E10atoms/cm2 | NA | |
BPD | ≤1500 ea/cm2 | ≤3000 ea/cm2 | NA |
TSD | ≤500 ea/cm2 | ≤1000 ea/cm2 | NA |
ʻAno o mua | |||
Imua | Si | ||
Hoʻopau ʻili | Si-maka CMP | ||
Nā ʻāpana | ≤60ea/wafer (nui≥0.3μm) | NA | |
Nā ʻōpala | ≤5ea/mm. Ka lōʻihi huila ≤Diameter | ʻO ka lōʻihi huila≤2*Diameter | NA |
ʻAlani ʻili/mau lua/ʻeleʻele/striations/ māwae/contamination | ʻAʻohe | NA | |
Nā ʻāpana lihi/indents/fracture/papa hex | ʻAʻohe | ||
Nā wahi polytype | ʻAʻohe | ʻĀpana huila≤20% | ʻĀpana huila≤30% |
Hōʻailona laser mua | ʻAʻohe | ||
ʻAno o hope | |||
Hoʻopau hope | C-maka CMP | ||
Nā ʻōpala | ≤5ea / mm, Ka lōʻihi huila≤2 * Anawaena | NA | |
Nā pōʻino hope (nā ʻāpana lihi/indents) | ʻAʻohe | ||
ʻōkalakala kua | Ra≤0.2nm (5μm*5μm) | ||
Hōʻailona laser hope | 1 mm (mai ka lihi luna) | ||
Kaulana | |||
Kaulana | Chamfer | ||
Hoʻopili ʻia | |||
Hoʻopili ʻia | Epi-mākaukau me ka hoʻopaʻa ʻumeke Puke cassette nui-wafer | ||
*Nā memo: "NA" ʻo ia hoʻi, ʻaʻohe noi ʻO nā mea i ʻōlelo ʻole ʻia e pili ana i SEMI-STD. |