Hoʻomaka i ka Silicon Carbide Coating
ʻO kā mākou Chemical Vapor Deposition (CVD) Silicon Carbide (SiC) coating he papa lōʻihi loa a paʻa i ka lole, kūpono no nā kaiapuni e koi ana i ka corrosion kiʻekiʻe a me ke kūpaʻa wela.Ka uhi ʻana o Silicon CarbideHoʻohana ʻia i nā ʻāpana lahilahi ma nā substrate like ʻole ma o ke kaʻina CVD, e hāʻawi ana i nā hiʻohiʻona hana ʻoi aku ka maikaʻi.
Nā mea nui
● -Maemae Kūikawā: E kaena ana i ka haku mele maemae loa o99.99995%, ko makouKa uhi ʻana o SiCe hoemi ana i ka poino i na hana semiconductor ko'iko'i.
● -Ke kū'ē kiʻekiʻe: Hōʻike i ke kūpaʻa maikaʻi loa i ka ʻaʻahu a me ka corrosion, e hoʻomaʻamaʻa maikaʻi ʻia no nā hoʻonohonoho kemika a me ka plasma.
● -High Thermal Conductivity: E hōʻoia i ka hana hilinaʻi ma lalo o nā wela wela ma muli o kāna mau waiwai wela.
● -Dimensional Stability: Hoʻomau i ka pono o ka hoʻonohonoho ʻana ma waena o nā ʻano wela, mahalo i kāna helu hoʻonui haʻahaʻa wela.
● -Hoʻonui Paʻakikī: Me ka helu paakiki o40 GPa, ko mākou pale SiC kū'ē i ka hopena nui a me ka abrasion.
● -Hoʻopau ʻili maʻalahi: Hāʻawi i kahi aniani e like me ka hoʻopau ʻana, e hōʻemi ana i ka hoʻokumu ʻana o nā ʻāpana a me ka hoʻonui ʻana i ka pono hana.
Nā noi
Semicera ʻO nā uhi SiCHoʻohana ʻia i nā ʻāpana like ʻole o ka hana semiconductor, me:
● -Hana ʻia ʻo LED Chip
● -Hana ʻia ʻo Polysilicon
● -Ka Uluwehi ʻana o Semiconductor Crystal
● -Silicon a me SiC Epitaxy
● -ʻO ka Thermal Oxidation and Diffusion (TO&D)
Hāʻawi mākou i nā ʻāpana SiC-coated i hana ʻia mai ka graphite isostatic ikaika kiʻekiʻe, carbon fiber-reinforced carbon a me 4N recrystallized silicon carbide, i hana ʻia no nā reactors fluidized-bed,ʻO nā mea hoʻololi STC-TCS, nā mea hōʻike manaʻo CZ, waʻa wafer SiC, hoe SiCwafer, paipu wafer SiC, a me nā mea lawe wafer i hoʻohana ʻia ma PECVD, silicon epitaxy, MOCVD kaʻina..
Nā pōmaikaʻi
● -Hoʻonui i ke ola: Hoʻemi nui i ka manawa hoʻopau o nā mea hana a me nā kumukūʻai mālama, hoʻonui i ka pono hana holoʻokoʻa.
● -Hoʻonui maikaʻi: Loaʻa i nā ʻili maʻemaʻe kiʻekiʻe e pono ai no ka hana semiconductor, pēlā e hoʻonui ai i ka maikaʻi o ka huahana.
● -Hoʻonui i ka pono: Hoʻonui i nā kaʻina hana wela a me CVD, e hopena i nā manawa pōkole pōkole a me nā hua kiʻekiʻe.
Nā Kūlana ʻenehana
● -Hoʻolālā: FCC β phase polycrystaline, ka mea nui (111)
● -Density: 3.21 g/cm³
● -Ka paakiki: 2500 Vickes paakiki (500g ukana)
● -Haʻi ʻoʻoleʻa: 3.0 MPa·m1/2
● -Ka huina hoonui wela (100–600 °C): 4.3 x 10-6k-1
● -Elastic Modulus(1300 ℃):435 GPa
● -Ka mānoanoa kiʻiʻoniʻoni maʻamau:100 µm
● -Ka 'oʻoleʻa o ka ʻili:2-10 µm
ʻIkepili Maʻemaʻe (Ana ʻia e Glow Discharge Mass Spectroscopy)
| ʻElemu | ppm | ʻElemu | ppm |
| Li | < 0.001 | Cu | < 0.01 |
| Be | < 0.001 | Zn | < 0.05 |
| Al | < 0.04 | Ga | < 0.01 |
| P | < 0.01 | Ge | < 0.05 |
| S | < 0.04 | As | < 0.005 |
| K | < 0.05 | In | < 0.01 |
| Ca | < 0.05 | Sn | < 0.01 |
| Ti | < 0.005 | Sb | < 0.01 |
| V | < 0.001 | W | < 0.05 |
| Cr | < 0.05 | Te | < 0.01 |
| Mn | < 0.005 | Pb | < 0.01 |
| Fe | < 0.05 | Bi | < 0.05 |
| Ni | < 0.01 |
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