SiC Pin Trays no ka ICP Etching Processes in the LED Industry

SiC Pin Trays no ICP Etching Processes in the LED Industry Featured Image

ʻO ka wehewehe pōkole:

ʻO Semicera's SiC Pin Trays for ICP Etching Processes in the LED Industry ua hoʻolālā kūikawā ʻia e hoʻonui i ka pono a me ka pololei i nā noi etching. Hana ʻia mai ka silicon carbide kiʻekiʻe, hāʻawi kēia mau pā pine i ke kūpaʻa wela maikaʻi loa, ka pale kemika, a me ka ikaika mechanical. He kūpono no nā kūlana koi o ke kaʻina hana LED, ʻo Semicera's SiC pin trays e hōʻoia i ka etching like ʻole, e hōʻemi i ka contamination, a hoʻomaikaʻi i ka hilinaʻi holoʻokoʻa holoʻokoʻa, e hāʻawi ana i ka hana LED kiʻekiʻe.

E hoʻouna i ka leka uila iā mākou

Huahana Huahana

Hōʻike huahana

Hāʻawi kā mākou hui i nā lawelawe kaʻina hana hoʻoheheʻe SiC ma ke ʻano CVD ma ka ʻili o ka graphite, ceramics a me nā mea ʻē aʻe, i hiki ai i nā kinoea kūikawā i loaʻa ke kalapona a me ke silicon ke hana i ke kiʻekiʻe kiʻekiʻe e kiʻi ai i nā molekala SiC maʻemaʻe kiʻekiʻe, nā molekole i waiho ʻia ma ka ʻili o nā mea i uhi ʻia, e hana ana i ka papa pale SIC.

Nā hiʻohiʻona nui:

1. Kiʻekiʻe wela oxidation kū'ē:

ʻoi aku ka maikaʻi o ka pale ʻana i ka oxidation ke kiʻekiʻe ka mahana e like me 1600 C.

2. Maʻemaʻe kiʻekiʻe: hana ʻia e ka hoʻoheheʻe ʻana i ka mahu ma lalo o ke kūlana chlorination kiʻekiʻe.

3. Erosion kū'ē: kiʻekiʻe paakiki, paʻaʻiliʻili, maikaʻi particles.

4. Ke kū'ē i ka corrosion: acid, alkali, paʻakai a me nā mea hoʻoulu.

ʻO ka diski kālai ʻia ʻo Silicon carbide (2)

Nā kiko'ī nui o ka CVD-SIC Coating

Nā Waiwai SiC-CVD
Hoʻomoe Crystal	Māhele FCC β
ʻO ka mānoanoa	g/cm ³	3.21
ʻoʻoleʻa	ʻO ka paʻakikī Vickers	2500
Ka nui o ka palaoa	μm	2~10
Maemae Kemika	%	99.99995
Kaha Wela	J·kg-1 ·K-1	640
Mahana Sublimation	℃	2700
Ikaika Pilikino	MPa (RT 4-point)	415
ʻO Young's Modulus	Gpa (4pt piko, 1300 ℃)	430
Hoʻonui wela (CTE)	10-6K-1	4.5
ʻO ke kau wela wela	(W/mK)	300