PART/1CVD (Chemical Vapor Deposition): Ma 900-2300 ℃, me ka hoʻohana ʻana iā TaCl5 a me CnHm ma ke ʻano he tantalum a me nā kumu kalapona, H₂ e like me ka hoʻohaʻahaʻa ʻana i ka lewa, Ar₂as lawe kinoea, reaction deposition film. ʻO ka uhi i hoʻomākaukauʻia he paʻakikī,ʻaʻahu a me ka maʻemaʻe kiʻekiʻe. Eia naʻe, aia kekahi mau pilikia ...
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