ʻO nā mea lawe pani pani SiC no ka etching semiconductor

ʻO ka wehewehe pōkole:

ʻO Semicera Semiconductor Technology Co., Ltd. kahi mea hoʻolako alakaʻi o nā ceramics semiconductor kiʻekiʻe. ʻO kā mākou huahana nui: Silicon carbide etched discs, silicon carbide boat trailers, silicon carbide wafer ships (PV & Semiconductor), silicon carbide furnace tubes, silicon carbide cantilever paddles, silicon carbide chuck, silicon carbide beams, a me CVD SiC coatings a ʻO nā pale TaC.

Hoʻohana nui ʻia nā huahana i ka semiconductor a me nā ʻoihana photovoltaic, e like me ka ulu ʻana o ka kristal, epitaxy, etching, packaging, coating and diffusion furnace equipment.

 

 


Huahana Huahana

Huahana Huahana

wehewehe

Hāʻawi kā mākou hui i nā lawelawe kaʻina hana hoʻoheheʻe SiC ma ke ʻano CVD ma ka ʻili o ka graphite, ceramics a me nā mea ʻē aʻe, i hiki ai i nā kinoea kūikawā i loaʻa ke kalapona a me ke silika i ke kiʻekiʻe kiʻekiʻe e loaʻa ai nā molekala SiC maʻemaʻe kiʻekiʻe. e hana ana i ka papa pale SIC.

Nā hiʻohiʻona nui

1. Kiʻekiʻe wela oxidation kū'ē:
ʻoi aku ka maikaʻi o ka pale ʻana i ka oxidation ke kiʻekiʻe ka mahana e like me 1600 C.
2. Maʻemaʻe kiʻekiʻe: hana ʻia e ka hoʻoheheʻe ʻana i ka mahu ma lalo o ke kūlana chlorination kiʻekiʻe.
3. Erosion kū'ē: kiʻekiʻe paakiki, paʻaʻiliʻili, maikaʻi particles.
4. Ke kū'ē i ka corrosion: acid, alkali, paʻakai a me nā mea hoʻoulu.

Nā kiko'ī nui o ka CVD-SIC Coating

Nā Waiwai SiC-CVD

Hoʻokumu Crystal Māhele FCC β
ʻO ka mānoanoa g/cm ³ 3.21
ʻoʻoleʻa ʻO ka paʻakikī o Vickers 2500
Ka nui o ka palaoa μm 2~10
Maemae Kemika % 99.99995
Kaha Wela J·kg-1 ·K-1 640
Mahana Sublimation 2700
Ikaika Felexural MPa (RT 4-point) 415
ʻO Young's Modulus Gpa (4pt piko, 1300 ℃) 430
Hoʻonui wela (CTE) 10-6K-1 4.5
ʻO ke kau wela wela (W/mK) 300
Kahi hana Semicera
Kahi hana Semicera 2
mīkini lako
ʻO ka hana CNN, hoʻomaʻemaʻe kemika, ka uhi CVD
ʻO kā mākou lawelawe

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