ʻO ka Barela Epitaxial Reactor i uhi ʻia ʻo SiC

ʻO SiC-Coated Epitaxial Reactor Barrel Kiʻi Hōʻike ʻia

ʻO ka wehewehe pōkole:

Hāʻawi ʻo Semicera i kahi ākea o nā susceptors a me nā ʻāpana graphite i hoʻolālā ʻia no nā reactors epitaxy like ʻole.

Ma o ka launa pū ʻana me nā OEM alakaʻi i ka ʻoihana, ka ʻike loea nui, a me ka hiki ke hana kiʻekiʻe, hāʻawi ʻo Semicera i nā hoʻolālā kūpono e hoʻokō i nā koi kikoʻī o kāu noi. ʻO kā mākou kūpaʻa i ka maikaʻi e hōʻoia e loaʻa iā ʻoe nā hopena maikaʻi loa no kāu epitaxy reactor pono.

E hoʻouna i ka leka uila iā mākou

Huahana Huahana

wehewehe

Hāʻawi kā mākou huiKa uhi ʻana o SiCkaʻina hana ma ka ʻili o ka graphite, keramika a me nā mea ʻē aʻe ma ke ʻano CVD, i hiki i nā kinoea kūikawā i loaʻa ke kalapona a me ke silika ke hana i ka wela kiʻekiʻe e loaʻa ai nā molekala Sic maʻemaʻe kiʻekiʻe, hiki ke waiho ʻia ma ka ʻili o nā mea i uhi ʻia e hana i kahiSiC pale paleno ka epitaxy barrel type hy pnotic.

pono (1)

pono (2)

Nā hiʻohiʻona nui

1. Kiʻekiʻe wela oxidation kū'ē:
ʻoi aku ka maikaʻi o ka pale ʻana i ka oxidation ke kiʻekiʻe ka mahana e like me 1600 C.
2. Maʻemaʻe kiʻekiʻe: hana ʻia e ka hoʻoheheʻe ʻana i ka mahu ma lalo o ke kūlana chlorination kiʻekiʻe.
3. Erosion kū'ē: kiʻekiʻe paakiki, paʻaʻiliʻili, maikaʻi particles.
4. Ke kū'ē i ka corrosion: acid, alkali, paʻakai a me nā mea hoʻoulu.

Nā kiko'ī nui o ka CVD-SIC Coating

Nā Waiwai SiC-CVD
Hoʻokumu Crystal	Māhele FCC β
ʻO ka mānoanoa	g/cm ³	3.21
ʻoʻoleʻa	ʻO ka paʻakikī o Vickers	2500
Ka nui o ka palaoa	μm	2~10
Maemae Kemika	%	99.99995
Kaha Wela	J·kg-1 ·K-1	640
Mahana Sublimation	℃	2700
Ikaika Felexural	MPa (RT 4-point)	415
ʻO Young's Modulus	Gpa (4pt piko, 1300 ℃)	430
Hoʻonui wela (CTE)	10-6K-1	4.5
ʻO ke kau wela wela	(W/mK)	300