ʻO ka Barela Epitaxial Reactor i uhi ʻia ʻo SiC

ʻO ka wehewehe pōkole:

Hāʻawi ʻo Semicera i kahi ākea o nā susceptors a me nā ʻāpana graphite i hoʻolālā ʻia no nā reactors epitaxy like ʻole.

Ma o ka launa pū ʻana me nā OEM alakaʻi i ka ʻoihana, ka ʻike loea nui, a me ka hiki ke hana kiʻekiʻe, hāʻawi ʻo Semicera i nā hoʻolālā kūpono e hoʻokō i nā koi kikoʻī o kāu noi.ʻO kā mākou kūpaʻa i ka maikaʻi e hōʻoia e loaʻa iā ʻoe nā hopena maikaʻi loa no kāu epitaxy reactor pono.

 

Huahana Huahana

Huahana Huahana

wehewehe

Hāʻawi kā mākou huiKa uhi ʻana o SiCkaʻina hana ma ka ʻili o ka graphite, keramika a me nā mea ʻē aʻe ma ke ʻano CVD, i hiki ai i nā kinoea kūikawā i loaʻa ke kalapona a me ke silicon ke hana i ka wela kiʻekiʻe e loaʻa ai nā molekala Sic maʻemaʻe kiʻekiʻe, hiki ke waiho ʻia ma ka ʻili o nā mea i uhi ʻia e hana i kahiSiC pale paleno ka epitaxy barrel type hy pnotic.

 

pono (1)

pono (2)

Nā hiʻohiʻona nui

1. Kiʻekiʻe wela oxidation kū'ē:
ʻoi aku ka maikaʻi o ka pale ʻana i ka oxidation ke kiʻekiʻe ka mahana e like me 1600 C.
2. Maʻemaʻe kiʻekiʻe: hana ʻia e ka hoʻoheheʻe ʻana i ka mahu ma lalo o ke kūlana chlorination kiʻekiʻe.
3. Erosion kū'ē: kiʻekiʻe paakiki, paʻaʻiliʻili, maikaʻi particles.
4. Ke kū'ē i ka corrosion: acid, alkali, paʻakai a me nā mea hoʻoulu.

Nā kiko'ī nui o ka CVD-SIC Coating

Nā Waiwai SiC-CVD
Hoʻomoe Crystal Māhele FCC β
ʻO ka mānoanoa g/cm ³ 3.21
ʻoʻoleʻa ʻO ka paʻakikī Vickers 2500
Ka nui o ka palaoa μm 2~10
Maemae Kemika % 99.99995
Kaha Wela J·kg-1 ·K-1 640
Mahana Sublimation 2700
Ikaika Felexural MPa (RT 4-point) 415
ʻO Young's Modulus Gpa (4pt piko, 1300 ℃) 430
Hoʻonui wela (CTE) 10-6K-1 4.5
ʻO ke kau wela wela (W/mK) 300
Kahi hana Semicera
Kahi hana Semicera 2
mīkini lako
ʻO ka hana CNN, hoʻomaʻemaʻe kemika, ka uhi CVD
ʻO kā mākou lawelawe

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