ʻO ka mea lawe lawe hana PSS no ka lawe ʻana i ka Wafer Semiconductor

ʻO ka mea lawe lawe hana ʻo PSS no ka lawe ʻana i ka Wafer Semiconductor kiʻi i hōʻike ʻia

ʻO ka wehewehe pōkole:

Hana ʻia ʻo Semicera's PSS Processing Carrier no Semiconductor Wafer Transmission no ka mālama pono ʻana a me ka hoʻololi ʻana i nā wafers semiconductor i ka wā hana. Hana ʻia mai nā mea kiʻekiʻe kiʻekiʻe, hōʻoia kēia mea lawe i ka alignment pololei, ka liʻiliʻi o ka contamination, a me ka lawe ʻana i ka wafer. Hoʻolālā ʻia no ka ʻoihana semiconductor, hoʻomaikaʻi nā mea lawe PSS o Semicera i ke kaʻina hana, hilinaʻi, a me ka hoʻoulu ʻana, e hoʻolilo iā lākou i mea nui i ka hana wafer a me ka lawelawe ʻana i nā noi.

E hoʻouna i ka leka uila iā mākou

Huahana Huahana

Hōʻike huahana

Hāʻawi kā mākou hui i nā lawelawe kaʻina hana hoʻoheheʻe SiC ma ke ʻano CVD ma ka ʻili o ka graphite, ceramics a me nā mea ʻē aʻe, i hiki ai i nā kinoea kūikawā i loaʻa ke kalapona a me ke silicon ke hana i ke kiʻekiʻe kiʻekiʻe e kiʻi ai i nā molekala SiC maʻemaʻe kiʻekiʻe, nā molekole i waiho ʻia ma ka ʻili o nā mea i uhi ʻia, e hana ana i ka papa pale SIC.

Nā hiʻohiʻona nui:

1. Kiʻekiʻe wela oxidation kū'ē:

ʻoi aku ka maikaʻi o ka pale ʻana i ka oxidation ke kiʻekiʻe ka mahana e like me 1600 C.

2. Maʻemaʻe kiʻekiʻe: hana ʻia e ka hoʻoheheʻe ʻana i ka mahu ma lalo o ke kūlana chlorination kiʻekiʻe.

3. Erosion kū'ē: kiʻekiʻe paakiki, paʻaʻiliʻili, maikaʻi particles.

4. Ke kū'ē i ka corrosion: acid, alkali, paʻakai a me nā mea hoʻoulu.

Nā kiko'ī nui o ka CVD-SIC Coating

Nā Waiwai SiC-CVD
Hoʻomoe Crystal	Māhele FCC β
ʻO ka mānoanoa	g/cm ³	3.21
ʻoʻoleʻa	ʻO ka paʻakikī Vickers	2500
Ka nui o ka palaoa	μm	2~10
Maemae Kemika	%	99.99995
Kaha Wela	J·kg-1 ·K-1	640
Mahana Sublimation	℃	2700
Ikaika Pilikino	MPa (RT 4-point)	415
ʻO Young's Modulus	Gpa (4pt piko, 1300 ℃)	430
Hoʻonui wela (CTE)	10-6K-1	4.5
ʻO ke kau wela wela	(W/mK)	300