ʻO ka Silicon Film na Semicera he mea kiʻekiʻe, pololei-engineered mea i hoʻolālā ʻia e hoʻokō i nā koi koʻikoʻi o ka ʻoihana semiconductor. Hana ʻia mai ke silika maʻemaʻe, hāʻawi kēia hāʻina kiʻiʻoniʻoni lahilahi i ka kūlike maikaʻi loa, ka maʻemaʻe kiʻekiʻe, a me nā waiwai uila a me ka wela. He kūpono ia no ka hoʻohana ʻana i nā noi semiconductor like ʻole, me ka hana ʻana o Si Wafer, SiC Substrate, SOI Wafer, SiN Substrate, a me Epi-Wafer. ʻO Semicera's Silicon Film e hōʻoiaʻiʻo i ka hana hilinaʻi a paʻa mau, e lilo ia i mea pono no ka microelectronics holomua.
ʻOi aku ka maikaʻi a me ka hana no ka hana semiconductor
Ua ʻike ʻia ʻo Semicera's Silicon Film no kona ikaika ʻenehana koʻikoʻi, kūpaʻa wela kiʻekiʻe, a me nā haʻahaʻa haʻahaʻa haʻahaʻa, he mea koʻikoʻi ia mau mea āpau i ka hana ʻana i nā semiconductor hana kiʻekiʻe. Inā hoʻohana ʻia i ka hana ʻana i nā mea hana Gallium Oxide (Ga2O3), AlN Wafer, a i ʻole Epi-Wafers, hāʻawi ke kiʻiʻoniʻoni i kumu paʻa no ka waiho ʻana i nā kiʻiʻoniʻoni lahilahi a me ka ulu epitaxial. ʻO kona kūlike me nā substrates semiconductor ʻē aʻe e like me SiC Substrate a me SOI Wafers e hōʻoia i ka hoʻohui pono ʻana i nā kaʻina hana e kū nei, e kōkua ana i ka mālama ʻana i nā hua kiʻekiʻe a me ka maikaʻi o ka huahana.
Nā noi i ka ʻoihana Semiconductor
Ma ka ʻoihana semiconductor, hoʻohana ʻia ʻo Semicera's Silicon Film i kahi ākea o nā noi, mai ka hana ʻana o Si Wafer a me SOI Wafer a hiki i nā hoʻohana kūikawā hou aku e like me SiN Substrate a me Epi-Wafer haku. ʻO ka maʻemaʻe kiʻekiʻe a me ka pololei o kēia kiʻiʻoniʻoni he mea nui ia i ka hana ʻana i nā ʻāpana holomua i hoʻohana ʻia i nā mea āpau mai nā microprocessors a me nā kaʻa i hoʻohui ʻia i nā mea optoelectronic.
He kuleana koʻikoʻi ka Silicon Film i nā kaʻina semiconductor e like me ka ulu ʻana o ka epitaxial, ka hoʻopaʻa ʻana i ka wafer, a me ka waiho ʻana i nā kiʻiʻoniʻoni lahilahi. He waiwai nui kona mau waiwai hilinaʻi no nā ʻoihana e koi ana i nā kaiapuni i hoʻomalu nui ʻia, e like me nā lumi hoʻomaʻemaʻe i nā mea semiconductor. Eia hou, hiki ke hoʻohui ʻia ka Silicon Film i loko o nā ʻōnaehana cassette no ka mālama pono ʻana i ka wafer a me ka lawe ʻana i ka wā hana.
Ka hilinaʻi lōʻihi a me ke kūpaʻa
ʻO kekahi o nā pōmaikaʻi koʻikoʻi o ka hoʻohana ʻana iā Semicera's Silicon Film ʻo ia ka hilinaʻi lōʻihi. Me kona kūpaʻa maikaʻi a me ka maikaʻi kūlike, hāʻawi kēia kiʻi i kahi hopena hilinaʻi no nā wahi hana kiʻekiʻe. Inā hoʻohana ʻia i nā polokalamu semiconductor kiʻekiʻe a i ʻole nā noi uila kiʻekiʻe, hōʻoia ʻo Semicera's Silicon Film e hiki i nā mea hana ke hoʻokō i ka hana kiʻekiʻe a me ka hilinaʻi ma waena o nā ʻano huahana.
No ke aha e koho ai i ka kiʻiʻoniʻoni silikon a Semicera?
ʻO ka Silicon Film mai Semicera he mea koʻikoʻi no nā noi ʻokiʻoki i ka ʻoihana semiconductor. ʻO kāna mau mea hana kiʻekiʻe, me ke kūpaʻa wela maikaʻi loa, ka maʻemaʻe kiʻekiʻe, a me ka ikaika mechanical, e lilo ia i koho kūpono no nā mea hana e ʻimi nei e hoʻokō i nā kūlana kiʻekiʻe loa i ka hana semiconductor. Mai Si Wafer a me SiC Substrate a hiki i ka hana ʻana i nā mea hana Gallium Oxide Ga2O3, hāʻawi kēia kiʻiʻoniʻoni i ka maikaʻi ʻole a me ka hana.
Me Semicera's Silicon Film, hiki iā ʻoe ke hilinaʻi i kahi huahana e kū ana i nā pono o ka hana semiconductor hou, e hāʻawi ana i kumu hilinaʻi no ka hanauna hou o ka uila.
Nā mea | Paahana | Ka noiʻi | Dummy |
Nā Kūlana Crystal | |||
Polytype | 4H | ||
Ua hewa ka hoʻonohonoho ʻana o ka ʻili | <11-20 >4±0.15° | ||
Nā Kūlana Uila | |||
Dopant | n-ʻano Nitrogen | ||
Kū'ē | 0.015-0.025ohm·cm | ||
Nā Kūlana Mechanical | |||
Anawaena | 150.0±0.2mm | ||
mānoanoa | 350±25 μm | ||
Kūlana pālahalaha mua | [1-100]±5° | ||
Ka lōʻihi pālahalaha mua | 47.5±1.5mm | ||
palahalaha lua | ʻAʻohe | ||
TTV | ≤5 μm | ≤10 μm | ≤15 μm |
LTV | ≤3 μm(5mm*5mm) | ≤5 μm(5mm*5mm) | ≤10 μm(5mm*5mm) |
Kakaka | -15μm ~ 15μm | -35μm ~ 35μm | -45μm ~ 45μm |
Warp | ≤35 μm | ≤45 μm | ≤55 μm |
'Oka (AFM) mua (Si-maka) | Ra≤0.2nm (5μm*5μm) | ||
Hoʻolālā | |||
Micropipe mānoanoa | <1 ea/cm2 | <10 ea/cm2 | <15 ea/cm2 |
Metala haumia | ≤5E10atoms/cm2 | NA | |
BPD | ≤1500 ea/cm2 | ≤3000 ea/cm2 | NA |
TSD | ≤500 ea/cm2 | ≤1000 ea/cm2 | NA |
ʻAno o mua | |||
Imua | Si | ||
Hoʻopau ʻili | Si-maka CMP | ||
Nā ʻāpana | ≤60ea/wafer (nui≥0.3μm) | NA | |
Nā ʻōpala | ≤5ea/mm. Ka lōʻihi huila ≤Diameter | ʻO ka lōʻihi huila≤2*Diameter | NA |
ʻAlani ʻili/mau lua/ʻeleʻele/striations/ māwae/contamination | ʻAʻohe | NA | |
Nā ʻāpana lihi/indents/fracture/papa hex | ʻAʻohe | ||
Nā wahi polytype | ʻAʻohe | ʻĀpana huila≤20% | ʻĀpana huila≤30% |
Hōʻailona laser mua | ʻAʻohe | ||
ʻAno o hope | |||
Hoʻopau hope | C-maka CMP | ||
Nā ʻōpala | ≤5ea / mm, Ka lōʻihi huila≤2 * Anawaena | NA | |
Nā pōʻino hope (nā ʻāpana lihi/indents) | ʻAʻohe | ||
ʻōkalakala kua | Ra≤0.2nm (5μm*5μm) | ||
Hōʻailona laser hope | 1 mm (mai ka lihi luna) | ||
Kaulana | |||
Kaulana | Chamfer | ||
Hoʻopili ʻia | |||
Hoʻopili ʻia | Epi-mākaukau me ka hoʻopaʻa ʻumeke Puke cassette nui-wafer | ||
*Nā memo: "NA" ʻo ia hoʻi, ʻaʻohe noi ʻO nā mea i ʻōlelo ʻole ʻia e pili ana i SEMI-STD. |