Kiʻiʻoniʻoni Silika

ʻO ka wehewehe pōkole:

ʻO ka Silicon Film na Semicera he mea hana kiʻekiʻe i hoʻolālā ʻia no nā ʻano noiʻi holomua i ka semiconductor a me nā ʻoihana uila. Hana ʻia mai ke silika maikaʻi loa, hāʻawi kēia kiʻiʻoniʻoni i kahi kūlike kūʻokoʻa, kūpaʻa wela, a me nā waiwai uila, e lilo ia i mea hoʻonā kūpono no ka waiho ʻana i nā kiʻiʻoniʻoni lahilahi, MEMS (Micro-Electro-Mechanical Systems), a me ka hana ʻana i nā mea hana semiconductor.


Huahana Huahana

Huahana Huahana

ʻO ka Silicon Film na Semicera he mea kiʻekiʻe, pololei-engineered mea i hoʻolālā ʻia e hoʻokō i nā koi koʻikoʻi o ka ʻoihana semiconductor. Hana ʻia mai ke silika maʻemaʻe, hāʻawi kēia hāʻina kiʻiʻoniʻoni lahilahi i ka kūlike maikaʻi loa, ka maʻemaʻe kiʻekiʻe, a me nā waiwai uila a me ka wela. He kūpono ia no ka hoʻohana ʻana i nā noi semiconductor like ʻole, me ka hana ʻana o Si Wafer, SiC Substrate, SOI Wafer, SiN Substrate, a me Epi-Wafer. ʻO Semicera's Silicon Film e hōʻoiaʻiʻo i ka hana hilinaʻi a paʻa mau, e lilo ia i mea pono no ka microelectronics holomua.

ʻOi aku ka maikaʻi a me ka hana no ka hana semiconductor

Ua ʻike ʻia ʻo Semicera's Silicon Film no kona ikaika ʻenehana koʻikoʻi, kūpaʻa wela kiʻekiʻe, a me nā haʻahaʻa haʻahaʻa haʻahaʻa, he mea koʻikoʻi ia mau mea āpau i ka hana ʻana i nā semiconductor hana kiʻekiʻe. Inā hoʻohana ʻia i ka hana ʻana i nā mea hana Gallium Oxide (Ga2O3), AlN Wafer, a i ʻole Epi-Wafers, hāʻawi ke kiʻiʻoniʻoni i kumu paʻa no ka waiho ʻana i nā kiʻiʻoniʻoni lahilahi a me ka ulu epitaxial. ʻO kona kūlike me nā substrates semiconductor ʻē aʻe e like me SiC Substrate a me SOI Wafers e hōʻoia i ka hoʻohui pono ʻana i nā kaʻina hana e kū nei, e kōkua ana i ka mālama ʻana i nā hua kiʻekiʻe a me ka maikaʻi o ka huahana.

Nā noi i ka ʻoihana Semiconductor

Ma ka ʻoihana semiconductor, hoʻohana ʻia ʻo Semicera's Silicon Film i kahi ākea o nā noi, mai ka hana ʻana o Si Wafer a me SOI Wafer a hiki i nā hoʻohana kūikawā hou aku e like me SiN Substrate a me Epi-Wafer haku. ʻO ka maʻemaʻe kiʻekiʻe a me ka pololei o kēia kiʻiʻoniʻoni he mea nui ia i ka hana ʻana i nā ʻāpana holomua i hoʻohana ʻia i nā mea āpau mai nā microprocessors a me nā kaʻa i hoʻohui ʻia i nā mea optoelectronic.

He kuleana koʻikoʻi ka Silicon Film i nā kaʻina semiconductor e like me ka ulu ʻana o ka epitaxial, ka hoʻopaʻa ʻana i ka wafer, a me ka waiho ʻana i nā kiʻiʻoniʻoni lahilahi. He waiwai nui kona mau waiwai hilinaʻi no nā ʻoihana e koi ana i nā kaiapuni i hoʻomalu nui ʻia, e like me nā lumi hoʻomaʻemaʻe i nā mea semiconductor. Eia hou, hiki ke hoʻohui ʻia ka Silicon Film i loko o nā ʻōnaehana cassette no ka mālama pono ʻana i ka wafer a me ka lawe ʻana i ka wā hana.

Ka hilinaʻi lōʻihi a me ke kūpaʻa

ʻO kekahi o nā pōmaikaʻi koʻikoʻi o ka hoʻohana ʻana iā Semicera's Silicon Film ʻo ia ka hilinaʻi lōʻihi. Me kona kūpaʻa maikaʻi a me ka maikaʻi kūlike, hāʻawi kēia kiʻi i kahi hopena hilinaʻi no nā wahi hana kiʻekiʻe. Inā hoʻohana ʻia i nā polokalamu semiconductor kiʻekiʻe a i ʻole nā ​​noi uila kiʻekiʻe, hōʻoia ʻo Semicera's Silicon Film e hiki i nā mea hana ke hoʻokō i ka hana kiʻekiʻe a me ka hilinaʻi ma waena o nā ʻano huahana.

No ke aha e koho ai i ka kiʻiʻoniʻoni silikon a Semicera?

ʻO ka Silicon Film mai Semicera he mea koʻikoʻi no nā noi ʻokiʻoki i ka ʻoihana semiconductor. ʻO kāna mau mea hana kiʻekiʻe, me ke kūpaʻa wela maikaʻi loa, ka maʻemaʻe kiʻekiʻe, a me ka ikaika mechanical, e lilo ia i koho kūpono no nā mea hana e ʻimi nei e hoʻokō i nā kūlana kiʻekiʻe loa i ka hana semiconductor. Mai Si Wafer a me SiC Substrate a hiki i ka hana ʻana i nā mea hana Gallium Oxide Ga2O3, hāʻawi kēia kiʻiʻoniʻoni i ka maikaʻi ʻole a me ka hana.

Me Semicera's Silicon Film, hiki iā ʻoe ke hilinaʻi i kahi huahana e kū ana i nā pono o ka hana semiconductor hou, e hāʻawi ana i kumu hilinaʻi no ka hanauna hou o ka uila.

Nā mea

Paahana

Ka noiʻi

Dummy

Nā Kūlana Crystal

Polytype

4H

Ua hewa ka hoʻonohonoho ʻana o ka ʻili

<11-20 >4±0.15°

Nā Kūlana Uila

Dopant

n-ʻano Nitrogen

Kū'ē

0.015-0.025ohm·cm

Nā Kūlana Mechanical

Anawaena

150.0±0.2mm

mānoanoa

350±25 μm

Kūlana pālahalaha mua

[1-100]±5°

Ka lōʻihi pālahalaha mua

47.5±1.5mm

palahalaha lua

ʻAʻohe

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm(5mm*5mm)

≤5 μm(5mm*5mm)

≤10 μm(5mm*5mm)

Kakaka

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

Warp

≤35 μm

≤45 μm

≤55 μm

'Oka (AFM) mua (Si-maka)

Ra≤0.2nm (5μm*5μm)

Hoʻolālā

Micropipe mānoanoa

<1 ea/cm2

<10 ea/cm2

<15 ea/cm2

Metala haumia

≤5E10atoms/cm2

NA

BPD

≤1500 ea/cm2

≤3000 ea/cm2

NA

TSD

≤500 ea/cm2

≤1000 ea/cm2

NA

ʻAno o mua

Imua

Si

Hoʻopau ʻili

Si-maka CMP

Nā ʻāpana

≤60ea/wafer (nui≥0.3μm)

NA

Nā ʻōpala

≤5ea/mm. Ka lōʻihi huila ≤Diameter

ʻO ka lōʻihi huila≤2*Diameter

NA

ʻAlani ʻili/mau lua/ʻeleʻele/striations/ māwae/contamination

ʻAʻohe

NA

Nā ʻāpana lihi/indents/fracture/papa hex

ʻAʻohe

Nā wahi polytype

ʻAʻohe

ʻĀpana huila≤20%

ʻĀpana huila≤30%

Hōʻailona laser mua

ʻAʻohe

ʻAno o hope

Hoʻopau hope

C-maka CMP

Nā ʻōpala

≤5ea / mm, Ka lōʻihi huila≤2 * Anawaena

NA

Nā pōʻino hope (nā ʻāpana lihi/indents)

ʻAʻohe

ʻōkalakala kua

Ra≤0.2nm (5μm*5μm)

Hōʻailona laser hope

1 mm (mai ka lihi luna)

Kaulana

Kaulana

Chamfer

Hoʻopili ʻia

Hoʻopili ʻia

Epi-mākaukau me ka hoʻopaʻa ʻumeke

Puke cassette nui-wafer

*Nā memo: "NA" ʻo ia hoʻi, ʻaʻohe noi ʻO nā mea i ʻōlelo ʻole ʻia e pili ana i SEMI-STD.

tech_1_2_size
SiC wafers

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