ʻO Gallium Nitride Substrates|GaN Wafers

ʻO ka wehewehe pōkole:

ʻO Gallium nitride (GaN), e like me nā mea silicon carbide (SiC), no ke kolu o ka hanauna o nā mea semiconductor me ka laulā ākea ākea, me ka laulā ākea ākea, kiʻekiʻe thermal conductivity, kiʻekiʻe electron saturation migration rate, a me ka haʻihaʻi kiʻekiʻe o ke kahua uila. hiʻona.Loaʻa i nā hāmeʻa GaN kahi ākea o nā noi noi ma ke alapine kiʻekiʻe, ka wikiwiki kiʻekiʻe a me ka mana kiʻekiʻe e koi ana i nā māla e like me ke kukui mālama ola LED, ka hōʻike projection laser, nā kaʻa ikehu hou, nā mākaʻikaʻi akamai, kamaʻilio 5G.


Huahana Huahana

Huahana Huahana

GaN Wafers

ʻO ke kolu o ka hanauna semiconductor waiwai ka nui o ka SiC, GaN, daimana, a me nā mea ʻē aʻe, no ka mea, ʻoi aku ka nui o kona ākea ākea (Eg) ma mua a i ʻole like me 2.3 electron volts (eV), ʻike ʻia hoʻi he mau mea semiconductor ākea band gap. Ke hoʻohālikelike ʻia me nā mea semiconductor o ka hanauna mua a me ka lua, ʻo ke kolu o ka hanauna semiconductor nā mea maikaʻi o ke kiʻekiʻe thermal conductivity, kiʻekiʻe breakdown uila kahua, kiʻekiʻe saturated electron migration rate a me ka ikaika hoʻopaʻa kiʻekiʻe, hiki ke hoʻokō i nā koi hou o ka ʻenehana uila hou no ke kiʻekiʻe. ka mahana, ka mana kiʻekiʻe, ke kaomi kiʻekiʻe, ke alapine kiʻekiʻe a me ka pale ʻana i ka radiation a me nā kūlana koʻikoʻi ʻē aʻe. Loaʻa iā ia nā manaʻo noiʻi koʻikoʻi ma nā kahua o ka pale aupuni, ka mokulele, ka aerospace, ka ʻimi ʻaila, ka mālama ʻana i ka optical, a me nā mea ʻē aʻe, a hiki ke hōʻemi i ka nalowale o ka ikehu ma mua o 50% i nā ʻoihana hoʻolālā he nui e like me ke kamaʻilio broadband, ikehu lā, hana kaʻa, ʻO nā kukui semiconductor, a me ka mākaʻikaʻi akamai, a hiki ke hōʻemi i ka nui o nā mea hana ma mua o 75%, he mea nui ia no ka hoʻomohala ʻana i ka ʻepekema kanaka a me ka ʻenehana.

 

'ikamu 项目

GaN-FS-CU-C50

GaN-FS-CN-C50

GaN-FS-C-SI-C50

Anawaena
晶圆直径

50.8 ± 1 mm

mānoanoa厚度

350 ± 25 μm

Kūlana
晶向

C plane (0001) off angle toward M-axis 0.35 ± 0.15°

Pāpā Kūikawā
主定位边

(1-100) 0 ± 0.5°, 16 ± 1 mm

Pāpā lua
次定位边

(11-20) 0 ± 3°, 8 ± 1 mm

ʻO ka hoʻokō
导电性

N-ʻano

N-ʻano

Semi-Insulating

Kū'ē (300K)
电阻率

< 0.1 Ω·cm

< 0.05 Ω·cm

> 106 Ω·cm

TTV
平整度

≤ 15 μm

PAHU
弯曲度

≤ 20 μm

ʻO ka ʻili o ke alo
Ga面粗糙度

< 0.2 nm (hoʻomaʻamaʻa ʻia);

a i ʻole <0.3 nm (ka hoʻomaʻemaʻe ʻia a me ka mālama ʻana i ka ʻili no ka epitaxy)

N Ka ʻili o ke alo
N面粗糙度

0.5 ~ 1.5 μm

koho: 1 ~ 3 nm (kahi lepo maikaʻi); < 0.2 nm (māmā)

Paʻaʻawaʻawa
位错密度

Mai 1 x 105 a 3 x 106 cm-2 (helu ʻia e CL)*

ʻAno ʻino ʻino
缺陷密度

< 2 knm-2

Wahi hiki ke hoohana
有效面积

> 90% (ka hoʻokaʻawale ʻana i nā hemahema o ka ʻaoʻao a me ka macro)

Hiki ke hoʻopilikino ʻia e like me nā koi o ka mea kūʻai aku, nā ʻano like ʻole o ka silicon, sapphire, SiC based GaN epitaxial sheet.

Kahi hana Semicera Kahi hana Semicera 2 mīkini lako ʻO ka hana CNN, hoʻomaʻemaʻe kemika, ka uhi CVD ʻO kā mākou lawelawe


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